Abstract
The authors fabricated diamond solution-gate field-effect transistors (SGFETs) with miniaturization of the channel length to 5 μm by photolithography. The channel surface was directly functionalized with amine by ultraviolet irradiation in an ammonia gas for 4 h and aminated diamond SGFETs were sensitive to pH by 40 mVpH. Urease was immobilized on the amine-modified channel surface, which was sensitive to urea by 27 μA /decade from 10-5 M to 10-2 M. The authors fabricated submicron-sized (500 nm) diamond SGFETs using electron-beam lithography. The transconductance (gm) was 56 mSmm, which was 930-fold greater than that of the 500 μm channel length.
Original language | English |
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Article number | 063901 |
Journal | Applied Physics Letters |
Volume | 90 |
Issue number | 6 |
DOIs | |
Publication status | Published - 2007 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)