Modification of thermal conductivity and thermal boundary resistance of amorphous Si thin films by Al doping

Tianzhuo Zhan*, Masahiro Goto, Yibin Xu, Yohei Kinoshita, Mamoru Ishikiriyama, Chikashi Nishimura

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds