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Modification of thermal conductivity and thermal boundary resistance of amorphous Si thin films by Al doping
Tianzhuo Zhan*, Masahiro Goto, Yibin Xu, Yohei Kinoshita, Mamoru Ishikiriyama, Chikashi Nishimura
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
10
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(Scopus)