MOLECULAR BEAM EPITAXIAL GROWTH OF InP.

Sunichi Gonda, Yuichi Hirofuji, Yuichi Matsushima, Seiji Mukai

Research output: Chapter in Book/Report/Conference proceedingChapter

Abstract

Epitaxial growth of InP single crystal thin films on 100-direction-oriented GaAs was tried using the molecular beam deposition method. Stoichiometric InP films have been successfully grown at the growth rate of 50 or 100 A/min and at the substrate temperature T, of 200 similar 300 degree C under the condition of sufficient supply of P//2 beams. In particular, InP films growth at T//s congruent 240 degree C were evaluated to be the best by reflection high energy electron diffraction, scanning electron microscopy and electrical measurements. Epitaxial surfaces prepared by this method were several hundred times as smooth as those grown by liquid-phase or vapor-phase epitaxy, and by doping Sn into the InP films during molecular-beam epitaxy the surface morphology was greatly improved.

Original languageEnglish
Title of host publicationBull Electrotech Lab Tokyo
Pages709-717
Number of pages9
Volume40
Edition8
Publication statusPublished - 1976
Externally publishedYes

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ASJC Scopus subject areas

  • Engineering(all)

Cite this

Gonda, S., Hirofuji, Y., Matsushima, Y., & Mukai, S. (1976). MOLECULAR BEAM EPITAXIAL GROWTH OF InP. In Bull Electrotech Lab Tokyo (8 ed., Vol. 40, pp. 709-717)