Molecular orbital study on the oxidation mechanism of hydrazine and hydroxylamine as reducing agents for electroless deposition process

Takuya Shimada, Amiko Tamaki, Hiromi Nakai, Takayuki Homma

    Research output: Contribution to journalArticle

    10 Citations (Scopus)

    Abstract

    The oxidation mechanism of hydrazine and hydroxylamine were investigated using molecular orbital (MO) calculation. Two pathways for their reactions were verified. One is initiated by hydrogen elimination from the reducing agent, followed by coordination of hydroxyl group to center nitrogen atom accompanied with electron emission. Another is initiated by coordination of hydroxyl group to hydrogen atom to form H2O, which is eliminated later, followed by electron emission. The calculated results indicated that the oxidation reactions of hydrazine preferentially proceeded via the second pathway. It was also indicated that only the first electron emission steps of the hydrazine oxidation took place on Cu surface, while the following reactions proceeded at near the solid/liquid interface. The oxidation of hydroxylamine also proceeded via the elimination reaction of H2O. After the oxidation, calculated heats of reactions suggested that OH radical, generated from N2O as a product, decomposed hydroxylamine.

    Original languageEnglish
    Pages (from-to)45-49
    Number of pages5
    JournalElectrochemistry
    Volume75
    Issue number1
    Publication statusPublished - 2007 Jan

    Fingerprint

    hydrazine
    Hydroxylamine
    Electroless plating
    Hydrazine
    Reducing Agents
    Reducing agents
    Molecular orbitals
    Electron emission
    Oxidation
    Hydroxyl Radical
    Hydrogen
    Orbital calculations
    Atoms
    Nitrogen

    Keywords

    • Electroless deposition process
    • Hydrazine
    • Hydroxylamine
    • Molecular orbital calculation

    ASJC Scopus subject areas

    • Electrochemistry

    Cite this

    Molecular orbital study on the oxidation mechanism of hydrazine and hydroxylamine as reducing agents for electroless deposition process. / Shimada, Takuya; Tamaki, Amiko; Nakai, Hiromi; Homma, Takayuki.

    In: Electrochemistry, Vol. 75, No. 1, 01.2007, p. 45-49.

    Research output: Contribution to journalArticle

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