Monitoring thermally induced cylindrical microphase separation of polystyrene-block-poly(Methyl methacrylate) by atomic force microscopy

Nobuya Hiroshiba; Ryo Okubo; Azusa N. Hattori; Hidekazu Tanaka; Masaru Nakagawa

doi:10.2494/photopolymer.29.659

Monitoring thermally induced cylindrical microphase separation of polystyrene-block-poly(Methyl methacrylate) by atomic force microscopy

Nobuya Hiroshiba, Ryo Okubo, Azusa N. Hattori, Hidekazu Tanaka, Masaru Nakagawa

Research output: Contribution to journal › Article

Abstract

Thermally induced growth of cylindrical microphase separation was observed for polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) thin films on native oxide silicon substrates unmodified and modified with hydroxy-terminated polystyrene (PS-OH) by atomic force microscopy in dynamic force mode. The degrees of long-range order of the cylindrical microphase separation structures were investigated using the correlation length values. The correlation length became constant over 30 seconds regardless of the kind of substrates, while the PS-OH modified substrate caused a longer correlation length and a shorter closely packed periodicity in the cylindrical microphase separation than the bare silicon substrate did.

Original language	English
Pages (from-to)	659-665
Number of pages	7
Journal	Journal of Photopolymer Science and Technology
Volume	29
Issue number	5
DOIs	https://doi.org/10.2494/photopolymer.29.659
Publication status	Published - 2016 Jan 1
Externally published	Yes

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Keywords

Block copolymer lithography
Cylindrical microphase separation
Polystyrene-block-poly(methyl methacrylate)

ASJC Scopus subject areas

Polymers and Plastics
Organic Chemistry
Materials Chemistry

Cite this

Hiroshiba, N., Okubo, R., Hattori, A. N., Tanaka, H., & Nakagawa, M. (2016). Monitoring thermally induced cylindrical microphase separation of polystyrene-block-poly(Methyl methacrylate) by atomic force microscopy. Journal of Photopolymer Science and Technology, 29(5), 659-665. https://doi.org/10.2494/photopolymer.29.659

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10.2494/photopolymer.29.659