Multilayered shear wave resonator consisting of c-axis tilted ZnO films

Naoki Morisato, Shinji Takayanagi, Takahiko Yanagitani, Mami Matsukawa, Yoshiaki Watanabe

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Multilayer resonator consisting of six layered ZnO films was fabricated using RF magnetron sputtering. To prevent degradation of crystalline orientation, SiO2 buffer layers were inserted between each ZnO layer. The influences of the method for SiO2 deposition on the crystalline orientation also have been investigated. Crystalline orientation of the c-axis tilted ZnO films were confirmed by XRD pole figure analysis and SEM images. In the sixth order mode shear mode resonant frequency, high efficient shear mode excitation with relatively suppressed extensional mode excitation was observed. More extensional mode suppression is expected by increasing the number of the layer.

Original languageEnglish
Title of host publication2009 IEEE International Ultrasonics Symposium and Short Courses, IUS 2009
DOIs
Publication statusPublished - 2009 Dec 1
Event2009 IEEE International Ultrasonics Symposium, IUS 2009 - Rome, Italy
Duration: 2009 Sep 202009 Sep 23

Publication series

NameProceedings - IEEE Ultrasonics Symposium
ISSN (Print)1051-0117

Other

Other2009 IEEE International Ultrasonics Symposium, IUS 2009
CountryItaly
CityRome
Period09/9/2009/9/23

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Keywords

  • C-axis-tilted ZnO films
  • Electromechanical coupling coefficient
  • Multilayered resonator
  • RF magnetron sputtering method
  • Thickness shear mode

ASJC Scopus subject areas

  • Acoustics and Ultrasonics

Cite this

Morisato, N., Takayanagi, S., Yanagitani, T., Matsukawa, M., & Watanabe, Y. (2009). Multilayered shear wave resonator consisting of c-axis tilted ZnO films. In 2009 IEEE International Ultrasonics Symposium and Short Courses, IUS 2009 [5441444] (Proceedings - IEEE Ultrasonics Symposium). https://doi.org/10.1109/ULTSYM.2009.5441444