Multilayered shear wave resonator consisting of c-axis tilted ZnO films

Naoki Morisato, Shinji Takayanagi, Takahiko Yanagitani, Mami Matsukawa, Yoshiaki Watanabe

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Multilayer resonator consisting of six layered ZnO films was fabricated using RF magnetron sputtering. To prevent degradation of crystalline orientation, SiO2 buffer layers were inserted between each ZnO layer. The influences of the method for SiO2 deposition on the crystalline orientation also have been investigated. Crystalline orientation of the c-axis tilted ZnO films were confirmed by XRD pole figure analysis and SEM images. In the sixth order mode shear mode resonant frequency, high efficient shear mode excitation with relatively suppressed extensional mode excitation was observed. More extensional mode suppression is expected by increasing the number of the layer.

Original languageEnglish
Title of host publicationProceedings - IEEE Ultrasonics Symposium
DOIs
Publication statusPublished - 2009
Externally publishedYes
Event2009 IEEE International Ultrasonics Symposium, IUS 2009 - Rome, Italy
Duration: 2009 Sep 202009 Sep 23

Other

Other2009 IEEE International Ultrasonics Symposium, IUS 2009
CountryItaly
CityRome
Period09/9/2009/9/23

Fingerprint

S waves
resonators
shear
excitation
resonant frequencies
magnetron sputtering
poles
buffers
retarding
degradation
scanning electron microscopy

Keywords

  • C-axis-tilted ZnO films
  • Electromechanical coupling coefficient
  • Multilayered resonator
  • RF magnetron sputtering method
  • Thickness shear mode

ASJC Scopus subject areas

  • Acoustics and Ultrasonics

Cite this

Morisato, N., Takayanagi, S., Yanagitani, T., Matsukawa, M., & Watanabe, Y. (2009). Multilayered shear wave resonator consisting of c-axis tilted ZnO films. In Proceedings - IEEE Ultrasonics Symposium [5441444] https://doi.org/10.1109/ULTSYM.2009.5441444

Multilayered shear wave resonator consisting of c-axis tilted ZnO films. / Morisato, Naoki; Takayanagi, Shinji; Yanagitani, Takahiko; Matsukawa, Mami; Watanabe, Yoshiaki.

Proceedings - IEEE Ultrasonics Symposium. 2009. 5441444.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Morisato, N, Takayanagi, S, Yanagitani, T, Matsukawa, M & Watanabe, Y 2009, Multilayered shear wave resonator consisting of c-axis tilted ZnO films. in Proceedings - IEEE Ultrasonics Symposium., 5441444, 2009 IEEE International Ultrasonics Symposium, IUS 2009, Rome, Italy, 09/9/20. https://doi.org/10.1109/ULTSYM.2009.5441444
Morisato N, Takayanagi S, Yanagitani T, Matsukawa M, Watanabe Y. Multilayered shear wave resonator consisting of c-axis tilted ZnO films. In Proceedings - IEEE Ultrasonics Symposium. 2009. 5441444 https://doi.org/10.1109/ULTSYM.2009.5441444
Morisato, Naoki ; Takayanagi, Shinji ; Yanagitani, Takahiko ; Matsukawa, Mami ; Watanabe, Yoshiaki. / Multilayered shear wave resonator consisting of c-axis tilted ZnO films. Proceedings - IEEE Ultrasonics Symposium. 2009.
@inproceedings{ef97d1a7987440f49eae8a0eb7d4ccfc,
title = "Multilayered shear wave resonator consisting of c-axis tilted ZnO films",
abstract = "Multilayer resonator consisting of six layered ZnO films was fabricated using RF magnetron sputtering. To prevent degradation of crystalline orientation, SiO2 buffer layers were inserted between each ZnO layer. The influences of the method for SiO2 deposition on the crystalline orientation also have been investigated. Crystalline orientation of the c-axis tilted ZnO films were confirmed by XRD pole figure analysis and SEM images. In the sixth order mode shear mode resonant frequency, high efficient shear mode excitation with relatively suppressed extensional mode excitation was observed. More extensional mode suppression is expected by increasing the number of the layer.",
keywords = "C-axis-tilted ZnO films, Electromechanical coupling coefficient, Multilayered resonator, RF magnetron sputtering method, Thickness shear mode",
author = "Naoki Morisato and Shinji Takayanagi and Takahiko Yanagitani and Mami Matsukawa and Yoshiaki Watanabe",
year = "2009",
doi = "10.1109/ULTSYM.2009.5441444",
language = "English",
isbn = "9781424443895",
booktitle = "Proceedings - IEEE Ultrasonics Symposium",

}

TY - GEN

T1 - Multilayered shear wave resonator consisting of c-axis tilted ZnO films

AU - Morisato, Naoki

AU - Takayanagi, Shinji

AU - Yanagitani, Takahiko

AU - Matsukawa, Mami

AU - Watanabe, Yoshiaki

PY - 2009

Y1 - 2009

N2 - Multilayer resonator consisting of six layered ZnO films was fabricated using RF magnetron sputtering. To prevent degradation of crystalline orientation, SiO2 buffer layers were inserted between each ZnO layer. The influences of the method for SiO2 deposition on the crystalline orientation also have been investigated. Crystalline orientation of the c-axis tilted ZnO films were confirmed by XRD pole figure analysis and SEM images. In the sixth order mode shear mode resonant frequency, high efficient shear mode excitation with relatively suppressed extensional mode excitation was observed. More extensional mode suppression is expected by increasing the number of the layer.

AB - Multilayer resonator consisting of six layered ZnO films was fabricated using RF magnetron sputtering. To prevent degradation of crystalline orientation, SiO2 buffer layers were inserted between each ZnO layer. The influences of the method for SiO2 deposition on the crystalline orientation also have been investigated. Crystalline orientation of the c-axis tilted ZnO films were confirmed by XRD pole figure analysis and SEM images. In the sixth order mode shear mode resonant frequency, high efficient shear mode excitation with relatively suppressed extensional mode excitation was observed. More extensional mode suppression is expected by increasing the number of the layer.

KW - C-axis-tilted ZnO films

KW - Electromechanical coupling coefficient

KW - Multilayered resonator

KW - RF magnetron sputtering method

KW - Thickness shear mode

UR - http://www.scopus.com/inward/record.url?scp=77952874243&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77952874243&partnerID=8YFLogxK

U2 - 10.1109/ULTSYM.2009.5441444

DO - 10.1109/ULTSYM.2009.5441444

M3 - Conference contribution

AN - SCOPUS:77952874243

SN - 9781424443895

BT - Proceedings - IEEE Ultrasonics Symposium

ER -