Multilayered shear wave resonator consisting of c-axis tilted ZnO films

Naoki Morisato; Shinji Takayanagi; Takahiko Yanagitani; Mami Matsukawa; Yoshiaki Watanabe

doi:10.1109/ULTSYM.2009.5441444

Multilayered shear wave resonator consisting of c-axis tilted ZnO films

Naoki Morisato^*, Shinji Takayanagi, Takahiko Yanagitani, Mami Matsukawa, Yoshiaki Watanabe

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

Multilayer resonator consisting of six layered ZnO films was fabricated using RF magnetron sputtering. To prevent degradation of crystalline orientation, SiO₂ buffer layers were inserted between each ZnO layer. The influences of the method for SiO₂ deposition on the crystalline orientation also have been investigated. Crystalline orientation of the c-axis tilted ZnO films were confirmed by XRD pole figure analysis and SEM images. In the sixth order mode shear mode resonant frequency, high efficient shear mode excitation with relatively suppressed extensional mode excitation was observed. More extensional mode suppression is expected by increasing the number of the layer.

Original language	English
Title of host publication	2009 IEEE International Ultrasonics Symposium and Short Courses, IUS 2009
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	2162-2165
Number of pages	4
ISBN (Print)	9781424443895
DOIs	https://doi.org/10.1109/ULTSYM.2009.5441444
Publication status	Published - 2009
Externally published	Yes
Event	2009 IEEE International Ultrasonics Symposium, IUS 2009 - Rome, Italy Duration: 2009 Sept 20 → 2009 Sept 23

Publication series

Name	Proceedings - IEEE Ultrasonics Symposium
ISSN (Print)	1051-0117

Other

Other	2009 IEEE International Ultrasonics Symposium, IUS 2009
Country/Territory	Italy
City	Rome
Period	09/9/20 → 09/9/23

Keywords

C-axis-tilted ZnO films
Electromechanical coupling coefficient
Multilayered resonator
RF magnetron sputtering method
Thickness shear mode

ASJC Scopus subject areas

Acoustics and Ultrasonics

Access to Document

10.1109/ULTSYM.2009.5441444

Cite this

Morisato, N., Takayanagi, S., Yanagitani, T., Matsukawa, M., & Watanabe, Y. (2009). Multilayered shear wave resonator consisting of c-axis tilted ZnO films. In 2009 IEEE International Ultrasonics Symposium and Short Courses, IUS 2009 (pp. 2162-2165). [5441444] (Proceedings - IEEE Ultrasonics Symposium). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ULTSYM.2009.5441444

Multilayered shear wave resonator consisting of c-axis tilted ZnO films. / Morisato, Naoki; Takayanagi, Shinji; Yanagitani, Takahiko et al.

2009 IEEE International Ultrasonics Symposium and Short Courses, IUS 2009. Institute of Electrical and Electronics Engineers Inc., 2009. p. 2162-2165 5441444 (Proceedings - IEEE Ultrasonics Symposium).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Morisato, N, Takayanagi, S, Yanagitani, T, Matsukawa, M & Watanabe, Y 2009, Multilayered shear wave resonator consisting of c-axis tilted ZnO films. in 2009 IEEE International Ultrasonics Symposium and Short Courses, IUS 2009., 5441444, Proceedings - IEEE Ultrasonics Symposium, Institute of Electrical and Electronics Engineers Inc., pp. 2162-2165, 2009 IEEE International Ultrasonics Symposium, IUS 2009, Rome, Italy, 09/9/20. https://doi.org/10.1109/ULTSYM.2009.5441444

Morisato N, Takayanagi S, Yanagitani T, Matsukawa M, Watanabe Y. Multilayered shear wave resonator consisting of c-axis tilted ZnO films. In 2009 IEEE International Ultrasonics Symposium and Short Courses, IUS 2009. Institute of Electrical and Electronics Engineers Inc. 2009. p. 2162-2165. 5441444. (Proceedings - IEEE Ultrasonics Symposium). doi: 10.1109/ULTSYM.2009.5441444

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title = "Multilayered shear wave resonator consisting of c-axis tilted ZnO films",

abstract = "Multilayer resonator consisting of six layered ZnO films was fabricated using RF magnetron sputtering. To prevent degradation of crystalline orientation, SiO2 buffer layers were inserted between each ZnO layer. The influences of the method for SiO2 deposition on the crystalline orientation also have been investigated. Crystalline orientation of the c-axis tilted ZnO films were confirmed by XRD pole figure analysis and SEM images. In the sixth order mode shear mode resonant frequency, high efficient shear mode excitation with relatively suppressed extensional mode excitation was observed. More extensional mode suppression is expected by increasing the number of the layer.",

keywords = "C-axis-tilted ZnO films, Electromechanical coupling coefficient, Multilayered resonator, RF magnetron sputtering method, Thickness shear mode",

author = "Naoki Morisato and Shinji Takayanagi and Takahiko Yanagitani and Mami Matsukawa and Yoshiaki Watanabe",

year = "2009",

doi = "10.1109/ULTSYM.2009.5441444",

language = "English",

isbn = "9781424443895",

series = "Proceedings - IEEE Ultrasonics Symposium",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

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AU - Takayanagi, Shinji

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AU - Watanabe, Yoshiaki

PY - 2009

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AB - Multilayer resonator consisting of six layered ZnO films was fabricated using RF magnetron sputtering. To prevent degradation of crystalline orientation, SiO2 buffer layers were inserted between each ZnO layer. The influences of the method for SiO2 deposition on the crystalline orientation also have been investigated. Crystalline orientation of the c-axis tilted ZnO films were confirmed by XRD pole figure analysis and SEM images. In the sixth order mode shear mode resonant frequency, high efficient shear mode excitation with relatively suppressed extensional mode excitation was observed. More extensional mode suppression is expected by increasing the number of the layer.

KW - C-axis-tilted ZnO films

KW - Electromechanical coupling coefficient

KW - Multilayered resonator

KW - RF magnetron sputtering method

KW - Thickness shear mode

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Multilayered shear wave resonator consisting of c-axis tilted ZnO films

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