Nano-patterning of a TiO2-organic hybrid material using interference of surface plasmon on aluminum

Hiroyo Segawa; Satoru Inoue; Minoru Osada; Yoshihiko Takeda

doi:10.1016/j.jphotochem.2011.02.019

Nano-patterning of a TiO₂-organic hybrid material using interference of surface plasmon on aluminum

Hiroyo Segawa^*, Satoru Inoue, Minoru Osada, Yoshihiko Takeda

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

Nano patterns of a TiO₂-organic hybrid material have been fabricated by interference of surface plasmon on aluminum. The TiO ₂-organic hybrid materials were prepared by the sol-gel method, and were irradiated through an aluminum mask by a UV light. After the unreacted parts were removed, patterns were obtained on the films. The patterns of lines approximately 300 nm in width and with a sub-100-nm height were obtained by controlling the UV irradiation time. It was confirmed that the patterns changed to anatase patterns by sintering at temperatures above 450 °C.

Original language	English
Pages (from-to)	232-238
Number of pages	7
Journal	Journal of Photochemistry and Photobiology A: Chemistry
Volume	221
Issue number	2-3
DOIs	https://doi.org/10.1016/j.jphotochem.2011.02.019
Publication status	Published - 2011 Jun 25
Externally published	Yes

Keywords

Ceramic
Interference
Nano-patterning
Organic-inorganic hybrid materials
Surface plasmon

ASJC Scopus subject areas

Chemistry(all)
Chemical Engineering(all)
Physics and Astronomy(all)

Access to Document

10.1016/j.jphotochem.2011.02.019

Cite this

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title = "Nano-patterning of a TiO2-organic hybrid material using interference of surface plasmon on aluminum",

abstract = "Nano patterns of a TiO2-organic hybrid material have been fabricated by interference of surface plasmon on aluminum. The TiO 2-organic hybrid materials were prepared by the sol-gel method, and were irradiated through an aluminum mask by a UV light. After the unreacted parts were removed, patterns were obtained on the films. The patterns of lines approximately 300 nm in width and with a sub-100-nm height were obtained by controlling the UV irradiation time. It was confirmed that the patterns changed to anatase patterns by sintering at temperatures above 450 °C.",

keywords = "Ceramic, Interference, Nano-patterning, Organic-inorganic hybrid materials, Surface plasmon",

author = "Hiroyo Segawa and Satoru Inoue and Minoru Osada and Yoshihiko Takeda",

year = "2011",

month = jun,

day = "25",

doi = "10.1016/j.jphotochem.2011.02.019",

language = "English",

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pages = "232--238",

journal = "Journal of Photochemistry and Photobiology A: Chemistry",

issn = "1010-6030",

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T1 - Nano-patterning of a TiO2-organic hybrid material using interference of surface plasmon on aluminum

AU - Segawa, Hiroyo

AU - Inoue, Satoru

AU - Osada, Minoru

AU - Takeda, Yoshihiko

PY - 2011/6/25

Y1 - 2011/6/25

N2 - Nano patterns of a TiO2-organic hybrid material have been fabricated by interference of surface plasmon on aluminum. The TiO 2-organic hybrid materials were prepared by the sol-gel method, and were irradiated through an aluminum mask by a UV light. After the unreacted parts were removed, patterns were obtained on the films. The patterns of lines approximately 300 nm in width and with a sub-100-nm height were obtained by controlling the UV irradiation time. It was confirmed that the patterns changed to anatase patterns by sintering at temperatures above 450 °C.

AB - Nano patterns of a TiO2-organic hybrid material have been fabricated by interference of surface plasmon on aluminum. The TiO 2-organic hybrid materials were prepared by the sol-gel method, and were irradiated through an aluminum mask by a UV light. After the unreacted parts were removed, patterns were obtained on the films. The patterns of lines approximately 300 nm in width and with a sub-100-nm height were obtained by controlling the UV irradiation time. It was confirmed that the patterns changed to anatase patterns by sintering at temperatures above 450 °C.

KW - Ceramic

KW - Interference

KW - Nano-patterning

KW - Organic-inorganic hybrid materials

KW - Surface plasmon

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