TY - JOUR
T1 - Nanopatterning of hydroxy-terminated self-assembled monolayer taking advantage of terminal group modification
AU - Miyake, Takeo
AU - Tanii, Takashi
AU - Kato, Koichi
AU - Hosaka, Takumi
AU - Kanari, Yuzo
AU - Sonobe, Hironori
AU - Ohdomari, Iwao
PY - 2006/8/4
Y1 - 2006/8/4
N2 - The feasibility of using an octenyltrimethoxysilane (OCS) self-assembled monolayer (SAM) as a high-resolution electron beam (EB) resist is investigated. The vinyl groups of the OCS SAM can be modified into hydroxy groups, which are useful for biochip fabrication. The hydroxy-modified OCS SAM exhibits higher sensitivity than a vinyl-terminated one. By using the hydroxy-modified OCS SAM as an EB resist, a miniaturized pattern of 18 nm is achieved. Since the hydroxy-modified OCS SAM is repellent to many proteins, this methodology can be useful for the fabrication of protein-immobilizing templates of a molecular scale.
AB - The feasibility of using an octenyltrimethoxysilane (OCS) self-assembled monolayer (SAM) as a high-resolution electron beam (EB) resist is investigated. The vinyl groups of the OCS SAM can be modified into hydroxy groups, which are useful for biochip fabrication. The hydroxy-modified OCS SAM exhibits higher sensitivity than a vinyl-terminated one. By using the hydroxy-modified OCS SAM as an EB resist, a miniaturized pattern of 18 nm is achieved. Since the hydroxy-modified OCS SAM is repellent to many proteins, this methodology can be useful for the fabrication of protein-immobilizing templates of a molecular scale.
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U2 - 10.1016/j.cplett.2006.05.074
DO - 10.1016/j.cplett.2006.05.074
M3 - Article
AN - SCOPUS:33746033380
VL - 426
SP - 361
EP - 364
JO - Chemical Physics Letters
JF - Chemical Physics Letters
SN - 0009-2614
IS - 4-6
ER -