Nanopatterning of hydroxy-terminated self-assembled monolayer taking advantage of terminal group modification

Takeo Miyake, Takashi Tanii, Koichi Kato, Takumi Hosaka, Yuzo Kanari, Hironori Sonobe, Iwao Ohdomari

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

The feasibility of using an octenyltrimethoxysilane (OCS) self-assembled monolayer (SAM) as a high-resolution electron beam (EB) resist is investigated. The vinyl groups of the OCS SAM can be modified into hydroxy groups, which are useful for biochip fabrication. The hydroxy-modified OCS SAM exhibits higher sensitivity than a vinyl-terminated one. By using the hydroxy-modified OCS SAM as an EB resist, a miniaturized pattern of 18 nm is achieved. Since the hydroxy-modified OCS SAM is repellent to many proteins, this methodology can be useful for the fabrication of protein-immobilizing templates of a molecular scale.

Original languageEnglish
Pages (from-to)361-364
Number of pages4
JournalChemical Physics Letters
Volume426
Issue number4-6
DOIs
Publication statusPublished - 2006 Aug 4

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physical and Theoretical Chemistry

Fingerprint Dive into the research topics of 'Nanopatterning of hydroxy-terminated self-assembled monolayer taking advantage of terminal group modification'. Together they form a unique fingerprint.

  • Cite this