Nanopatterning of hydroxy-terminated self-assembled monolayer taking advantage of terminal group modification

Takeo Miyake; Takashi Tanii; Koichi Kato; Takumi Hosaka; Yuzo Kanari; Hironori Sonobe; Iwao Ohdomari

doi:10.1016/j.cplett.2006.05.074

Nanopatterning of hydroxy-terminated self-assembled monolayer taking advantage of terminal group modification

Takeo Miyake^*, Takashi Tanii, Koichi Kato, Takumi Hosaka, Yuzo Kanari, Hironori Sonobe, Iwao Ohdomari

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

The feasibility of using an octenyltrimethoxysilane (OCS) self-assembled monolayer (SAM) as a high-resolution electron beam (EB) resist is investigated. The vinyl groups of the OCS SAM can be modified into hydroxy groups, which are useful for biochip fabrication. The hydroxy-modified OCS SAM exhibits higher sensitivity than a vinyl-terminated one. By using the hydroxy-modified OCS SAM as an EB resist, a miniaturized pattern of 18 nm is achieved. Since the hydroxy-modified OCS SAM is repellent to many proteins, this methodology can be useful for the fabrication of protein-immobilizing templates of a molecular scale.

Original language	English
Pages (from-to)	361-364
Number of pages	4
Journal	Chemical Physics Letters
Volume	426
Issue number	4-6
DOIs	https://doi.org/10.1016/j.cplett.2006.05.074
Publication status	Published - 2006 Aug 4

ASJC Scopus subject areas

Physics and Astronomy(all)
Physical and Theoretical Chemistry

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10.1016/j.cplett.2006.05.074

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title = "Nanopatterning of hydroxy-terminated self-assembled monolayer taking advantage of terminal group modification",

abstract = "The feasibility of using an octenyltrimethoxysilane (OCS) self-assembled monolayer (SAM) as a high-resolution electron beam (EB) resist is investigated. The vinyl groups of the OCS SAM can be modified into hydroxy groups, which are useful for biochip fabrication. The hydroxy-modified OCS SAM exhibits higher sensitivity than a vinyl-terminated one. By using the hydroxy-modified OCS SAM as an EB resist, a miniaturized pattern of 18 nm is achieved. Since the hydroxy-modified OCS SAM is repellent to many proteins, this methodology can be useful for the fabrication of protein-immobilizing templates of a molecular scale.",

author = "Takeo Miyake and Takashi Tanii and Koichi Kato and Takumi Hosaka and Yuzo Kanari and Hironori Sonobe and Iwao Ohdomari",

note = "Funding Information: This work is supported by a Grant-in-Aid for Center of Excellence (COE) Research, by {\textquoteleft}Establishment of Consolidated Research Institute for Advanced Science and Medical Care{\textquoteright} from MEXT, Japan, by The Sumitomo Foundation and by Reseach Fellow of the Japan Society for the Promotion of Science. ",

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doi = "10.1016/j.cplett.2006.05.074",

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T1 - Nanopatterning of hydroxy-terminated self-assembled monolayer taking advantage of terminal group modification

AU - Miyake, Takeo

AU - Tanii, Takashi

AU - Kato, Koichi

AU - Hosaka, Takumi

AU - Kanari, Yuzo

AU - Sonobe, Hironori

AU - Ohdomari, Iwao

N1 - Funding Information: This work is supported by a Grant-in-Aid for Center of Excellence (COE) Research, by ‘Establishment of Consolidated Research Institute for Advanced Science and Medical Care’ from MEXT, Japan, by The Sumitomo Foundation and by Reseach Fellow of the Japan Society for the Promotion of Science.

PY - 2006/8/4

Y1 - 2006/8/4

N2 - The feasibility of using an octenyltrimethoxysilane (OCS) self-assembled monolayer (SAM) as a high-resolution electron beam (EB) resist is investigated. The vinyl groups of the OCS SAM can be modified into hydroxy groups, which are useful for biochip fabrication. The hydroxy-modified OCS SAM exhibits higher sensitivity than a vinyl-terminated one. By using the hydroxy-modified OCS SAM as an EB resist, a miniaturized pattern of 18 nm is achieved. Since the hydroxy-modified OCS SAM is repellent to many proteins, this methodology can be useful for the fabrication of protein-immobilizing templates of a molecular scale.

AB - The feasibility of using an octenyltrimethoxysilane (OCS) self-assembled monolayer (SAM) as a high-resolution electron beam (EB) resist is investigated. The vinyl groups of the OCS SAM can be modified into hydroxy groups, which are useful for biochip fabrication. The hydroxy-modified OCS SAM exhibits higher sensitivity than a vinyl-terminated one. By using the hydroxy-modified OCS SAM as an EB resist, a miniaturized pattern of 18 nm is achieved. Since the hydroxy-modified OCS SAM is repellent to many proteins, this methodology can be useful for the fabrication of protein-immobilizing templates of a molecular scale.

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DO - 10.1016/j.cplett.2006.05.074

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EP - 364

JO - Chemical Physics Letters

JF - Chemical Physics Letters

SN - 0009-2614

IS - 4-6

ER -

Nanopatterning of hydroxy-terminated self-assembled monolayer taking advantage of terminal group modification

Abstract

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