Abstract
The feasibility of using an octenyltrimethoxysilane (OCS) self-assembled monolayer (SAM) as a high-resolution electron beam (EB) resist is investigated. The vinyl groups of the OCS SAM can be modified into hydroxy groups, which are useful for biochip fabrication. The hydroxy-modified OCS SAM exhibits higher sensitivity than a vinyl-terminated one. By using the hydroxy-modified OCS SAM as an EB resist, a miniaturized pattern of 18 nm is achieved. Since the hydroxy-modified OCS SAM is repellent to many proteins, this methodology can be useful for the fabrication of protein-immobilizing templates of a molecular scale.
| Original language | English |
|---|---|
| Pages (from-to) | 361-364 |
| Number of pages | 4 |
| Journal | Chemical Physics Letters |
| Volume | 426 |
| Issue number | 4-6 |
| DOIs | |
| Publication status | Published - 2006 Aug 4 |
ASJC Scopus subject areas
- Physics and Astronomy(all)
- Physical and Theoretical Chemistry
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Miyake, T., Tanii, T., Kato, K., Hosaka, T., Kanari, Y., Sonobe, H., & Ohdomari, I. (2006). Nanopatterning of hydroxy-terminated self-assembled monolayer taking advantage of terminal group modification. Chemical Physics Letters, 426(4-6), 361-364. https://doi.org/10.1016/j.cplett.2006.05.074