Nanoscale pore fabrication for high sensitivity waveguide-mode biosensors

Makoto Fujimaki, Carsten Rockstuhl, Xiaomin Wang, Koichi Awazu, Junji Tominaga, Takahiro Ikeda, Yoshimichi Ohki, Tetsuro Komatsubara

    Research output: Contribution to journalArticle

    16 Citations (Scopus)

    Abstract

    Swift heavy ion irradiation of dielectric materials forms latent tracks and selective etching of them results in the formation of well defined nanopores in the material. Irradiation of Au ions accelerated with 137 MeV followed by etching with vapor of hydrofluoric acid successfully formed nanopores with diameter of 30 nm and depth of 400 nm in a waveguide made of amorphous SiO2. In the present research, the nanopores were applied to improve sensitivity of an evanescent-field-coupled waveguide mode sensor that detects adsorption and/or adhesion of molecules at the surface of the waveguide and in the nanopores. Increase in the sensitivity was confirmed by examining the shift in the angular position necessary to excite the waveguide mode before and after adsorption of streptavidin to biotinyl groups.

    Original languageEnglish
    Pages (from-to)1685-1689
    Number of pages5
    JournalMicroelectronic Engineering
    Volume84
    Issue number5-8
    DOIs
    Publication statusPublished - 2007 May

    Fingerprint

    Nanopores
    bioinstrumentation
    Biosensors
    Waveguides
    waveguides
    porosity
    Fabrication
    fabrication
    sensitivity
    Etching
    etching
    Hydrofluoric Acid
    Evanescent fields
    Heavy Ions
    Adsorption
    Hydrofluoric acid
    adsorption
    Streptavidin
    hydrofluoric acid
    Ion bombardment

    Keywords

    • Biosensor
    • Evanescent field
    • Ion irradiation
    • Nanopore
    • Waveguide mode

    ASJC Scopus subject areas

    • Hardware and Architecture
    • Electrical and Electronic Engineering
    • Electronic, Optical and Magnetic Materials
    • Surfaces, Coatings and Films
    • Atomic and Molecular Physics, and Optics

    Cite this

    Fujimaki, M., Rockstuhl, C., Wang, X., Awazu, K., Tominaga, J., Ikeda, T., ... Komatsubara, T. (2007). Nanoscale pore fabrication for high sensitivity waveguide-mode biosensors. Microelectronic Engineering, 84(5-8), 1685-1689. https://doi.org/10.1016/j.mee.2007.01.264

    Nanoscale pore fabrication for high sensitivity waveguide-mode biosensors. / Fujimaki, Makoto; Rockstuhl, Carsten; Wang, Xiaomin; Awazu, Koichi; Tominaga, Junji; Ikeda, Takahiro; Ohki, Yoshimichi; Komatsubara, Tetsuro.

    In: Microelectronic Engineering, Vol. 84, No. 5-8, 05.2007, p. 1685-1689.

    Research output: Contribution to journalArticle

    Fujimaki, M, Rockstuhl, C, Wang, X, Awazu, K, Tominaga, J, Ikeda, T, Ohki, Y & Komatsubara, T 2007, 'Nanoscale pore fabrication for high sensitivity waveguide-mode biosensors', Microelectronic Engineering, vol. 84, no. 5-8, pp. 1685-1689. https://doi.org/10.1016/j.mee.2007.01.264
    Fujimaki M, Rockstuhl C, Wang X, Awazu K, Tominaga J, Ikeda T et al. Nanoscale pore fabrication for high sensitivity waveguide-mode biosensors. Microelectronic Engineering. 2007 May;84(5-8):1685-1689. https://doi.org/10.1016/j.mee.2007.01.264
    Fujimaki, Makoto ; Rockstuhl, Carsten ; Wang, Xiaomin ; Awazu, Koichi ; Tominaga, Junji ; Ikeda, Takahiro ; Ohki, Yoshimichi ; Komatsubara, Tetsuro. / Nanoscale pore fabrication for high sensitivity waveguide-mode biosensors. In: Microelectronic Engineering. 2007 ; Vol. 84, No. 5-8. pp. 1685-1689.
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