Nanovoid formation through the annealing of amorphous Al2O 3 and WO3 films

R. Nakamura; T. Shudo; A. Hirata; M. Ishimaru; H. Nakajima

doi:10.1016/j.scriptamat.2010.09.043

Nanovoid formation through the annealing of amorphous Al₂O ₃ and WO₃ films

R. Nakamura, T. Shudo, A. Hirata, M. Ishimaru, H. Nakajima

Graduate School of Fundamental Science and Engineering

Research output: Contribution to journal › Article

16 Citations (Scopus)

Abstract

A high density of nanovoids between 2 and 13 nm in size was produced during the crystallization process when amorphous Al₂O₃ and WO₃, which are 20-30% lower in density than their crystalline phases, were annealed. By contrast, no formation or growth of nanovoids was observed during the crystallization of amorphous TiO₂, which has a density 2% lower than its crystalline phase. These results suggest that large differences in density between amorphous and crystalline oxides can be utilized to produce nanoporous structures.

Original language	English
Pages (from-to)	197-200
Number of pages	4
Journal	Scripta Materialia
Volume	64
Issue number	2
DOIs	https://doi.org/10.1016/j.scriptamat.2010.09.043
Publication status	Published - 2011 Jan

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Keywords

Amorphous
Crystallization
Nanoporous
Oxides
TEM

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering
Metals and Alloys

Cite this

Nakamura, R., Shudo, T., Hirata, A., Ishimaru, M., & Nakajima, H. (2011). Nanovoid formation through the annealing of amorphous Al₂O ₃ and WO₃ films. Scripta Materialia, 64(2), 197-200. https://doi.org/10.1016/j.scriptamat.2010.09.043

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10.1016/j.scriptamat.2010.09.043