Normally-Off C-H Diamond MOSFETs with Partial C-O Channel Achieving 2-kV Breakdown Voltage

Yuya Kitabayashi, Takuya Kudo, Hidetoshi Tsuboi, Tetsuya Yamada, Dechen Xu, Masanobu Shibata, Daisuke Matsumura, Yuya Hayashi, Mohd Syamsul, Masafumi Inaba, Atsushi Hiraiwa, Hiroshi Kawarada

    Research output: Contribution to journalArticle

    37 Citations (Scopus)


    Diamond has unique physical properties, which show great promise for applications in the next generation power devices. Hydrogen-terminated (C-H) diamond metal-oxide-semiconductor field-effect transistors (MOSFETs) often have normally-on operation in devices, because the C-H channel features a p-type inversion layer; however, normally-off devices are preferable in power MOSFETs from the viewpoint of fail safety. We fabricated hydrogen-terminated (C-H) diamond MOSFETs using a partially oxidized (partial C-O) channel. The fabricated MOSFETs showed a high breakdown voltage of over 2 kV at room temperature and normally-off characteristics with a gate threshold voltage Vth of -2.5 - 4 V.

    Original languageEnglish
    Article number7837668
    Pages (from-to)363-366
    Number of pages4
    JournalIEEE Electron Device Letters
    Issue number3
    Publication statusPublished - 2017 Mar 1



    • 2 dimensional hole gas
    • diamond
    • high voltage
    • MOSFETs
    • normally-off
    • wide bandgap semiconductor

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Electrical and Electronic Engineering

    Cite this

    Kitabayashi, Y., Kudo, T., Tsuboi, H., Yamada, T., Xu, D., Shibata, M., Matsumura, D., Hayashi, Y., Syamsul, M., Inaba, M., Hiraiwa, A., & Kawarada, H. (2017). Normally-Off C-H Diamond MOSFETs with Partial C-O Channel Achieving 2-kV Breakdown Voltage. IEEE Electron Device Letters, 38(3), 363-366. [7837668].