Novel polysiloxane formation process from dimethyldiethoxysilane in the presence of oxalic acid - Code

BP10

    Research output: Contribution to journalArticle

    4 Citations (Scopus)

    Abstract

    Polysiloxane formation in dimethyldiethoxysilane (DMDES)-ethyl alcohol (EtOH(D))-oxalic acid (OA) (DMDES:EtOH(D):OA=1:2:0.5) and DMDES-dimethylsulfoxide (DMSO)-OA (DMDES:DMSO:OA=1:2:0.5) systems was investigated by gas chromatography-mass spectrometry and 29Si-nuclear magnetic resonance. While the DMDES-EtOH(D)-OA system was homogeneous, the DMDES-DMSO-OA system consisted of two immiscible phases. In both systems, ethoxy-terminated linear oligomers ((EtO)Me2SiO(Me2SiO)nSiMe2(OEt); n=0-4, Et = C2H5, Me = CH3) and cyclic tetramer ((Me2SiO)4) were identified. The reaction mechanism for polysiloxane formation is discussed.

    Original languageEnglish
    Pages (from-to)153-156
    Number of pages4
    JournalJournal of Sol-Gel Science and Technology
    Volume2
    Issue number1-3
    DOIs
    Publication statusPublished - 1994 Jan

    Fingerprint

    Siloxanes
    Oxalic Acid
    polysiloxanes
    oxalic acid
    Oxalic acid
    Silicones
    Dimethyl Sulfoxide
    gas chromatography
    oligomers
    Oligomers
    Gas chromatography
    Mass spectrometry
    Ethanol
    ethyl alcohol
    mass spectroscopy
    Nuclear magnetic resonance
    nuclear magnetic resonance

    Keywords

    • dimethyldiethoxysilane
    • non-aqueous system
    • oxalic acids
    • polydimethylsiloxane
    • reaction mechanism

    ASJC Scopus subject areas

    • Ceramics and Composites

    Cite this

    @article{e531aa6a8ef24e6593591efafb5d9e41,
    title = "Novel polysiloxane formation process from dimethyldiethoxysilane in the presence of oxalic acid - Code: BP10",
    abstract = "Polysiloxane formation in dimethyldiethoxysilane (DMDES)-ethyl alcohol (EtOH(D))-oxalic acid (OA) (DMDES:EtOH(D):OA=1:2:0.5) and DMDES-dimethylsulfoxide (DMSO)-OA (DMDES:DMSO:OA=1:2:0.5) systems was investigated by gas chromatography-mass spectrometry and 29Si-nuclear magnetic resonance. While the DMDES-EtOH(D)-OA system was homogeneous, the DMDES-DMSO-OA system consisted of two immiscible phases. In both systems, ethoxy-terminated linear oligomers ((EtO)Me2SiO(Me2SiO)nSiMe2(OEt); n=0-4, Et = C2H5, Me = CH3) and cyclic tetramer ((Me2SiO)4) were identified. The reaction mechanism for polysiloxane formation is discussed.",
    keywords = "dimethyldiethoxysilane, non-aqueous system, oxalic acids, polydimethylsiloxane, reaction mechanism",
    author = "J. Chiba and Yoshiyuki Sugahara and Kazuyuki Kuroda",
    year = "1994",
    month = "1",
    doi = "10.1007/BF00486231",
    language = "English",
    volume = "2",
    pages = "153--156",
    journal = "Journal of Sol-Gel Science and Technology",
    issn = "0928-0707",
    publisher = "Springer Netherlands",
    number = "1-3",

    }

    TY - JOUR

    T1 - Novel polysiloxane formation process from dimethyldiethoxysilane in the presence of oxalic acid - Code

    T2 - BP10

    AU - Chiba, J.

    AU - Sugahara, Yoshiyuki

    AU - Kuroda, Kazuyuki

    PY - 1994/1

    Y1 - 1994/1

    N2 - Polysiloxane formation in dimethyldiethoxysilane (DMDES)-ethyl alcohol (EtOH(D))-oxalic acid (OA) (DMDES:EtOH(D):OA=1:2:0.5) and DMDES-dimethylsulfoxide (DMSO)-OA (DMDES:DMSO:OA=1:2:0.5) systems was investigated by gas chromatography-mass spectrometry and 29Si-nuclear magnetic resonance. While the DMDES-EtOH(D)-OA system was homogeneous, the DMDES-DMSO-OA system consisted of two immiscible phases. In both systems, ethoxy-terminated linear oligomers ((EtO)Me2SiO(Me2SiO)nSiMe2(OEt); n=0-4, Et = C2H5, Me = CH3) and cyclic tetramer ((Me2SiO)4) were identified. The reaction mechanism for polysiloxane formation is discussed.

    AB - Polysiloxane formation in dimethyldiethoxysilane (DMDES)-ethyl alcohol (EtOH(D))-oxalic acid (OA) (DMDES:EtOH(D):OA=1:2:0.5) and DMDES-dimethylsulfoxide (DMSO)-OA (DMDES:DMSO:OA=1:2:0.5) systems was investigated by gas chromatography-mass spectrometry and 29Si-nuclear magnetic resonance. While the DMDES-EtOH(D)-OA system was homogeneous, the DMDES-DMSO-OA system consisted of two immiscible phases. In both systems, ethoxy-terminated linear oligomers ((EtO)Me2SiO(Me2SiO)nSiMe2(OEt); n=0-4, Et = C2H5, Me = CH3) and cyclic tetramer ((Me2SiO)4) were identified. The reaction mechanism for polysiloxane formation is discussed.

    KW - dimethyldiethoxysilane

    KW - non-aqueous system

    KW - oxalic acids

    KW - polydimethylsiloxane

    KW - reaction mechanism

    UR - http://www.scopus.com/inward/record.url?scp=2342652643&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=2342652643&partnerID=8YFLogxK

    U2 - 10.1007/BF00486231

    DO - 10.1007/BF00486231

    M3 - Article

    VL - 2

    SP - 153

    EP - 156

    JO - Journal of Sol-Gel Science and Technology

    JF - Journal of Sol-Gel Science and Technology

    SN - 0928-0707

    IS - 1-3

    ER -