Observation of electron beam damage in thin-film SiO2 on Si with scanning Auger electron microscope

S. Ichimura, R. Shimizu

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Abstract

Electron beam damage to thin-film SiO2 was observed with a scanning Auger electron microscope. After a certain degree of electron beam exposure, changes in both the surface topography and chemical composition were investigated. The result suggested that there is a close relationship between the beam damage and the dissipation of incident energy in thin-film SiO 2.

Original languageEnglish
Pages (from-to)6020-6022
Number of pages3
JournalJournal of Applied Physics
Volume50
Issue number9
DOIs
Publication statusPublished - 1979 Dec 1

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ASJC Scopus subject areas

  • Physics and Astronomy(all)

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