Observation of electron beam damage in thin-film SiO2 on Si with scanning Auger electron microscope

S. Ichimura; R. Shimizu

doi:10.1063/1.326677

Observation of electron beam damage in thin-film SiO₂ on Si with scanning Auger electron microscope

S. Ichimura, R. Shimizu

Research output: Contribution to journal › Article › peer-review

26 Citations (Scopus)

Abstract

Electron beam damage to thin-film SiO₂ was observed with a scanning Auger electron microscope. After a certain degree of electron beam exposure, changes in both the surface topography and chemical composition were investigated. The result suggested that there is a close relationship between the beam damage and the dissipation of incident energy in thin-film SiO ₂.

Original language	English
Pages (from-to)	6020-6022
Number of pages	3
Journal	Journal of Applied Physics
Volume	50
Issue number	9
DOIs	https://doi.org/10.1063/1.326677
Publication status	Published - 1979
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy(all)

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@article{91ab88d20fc8486cbefad0c53e6c2032,

title = "Observation of electron beam damage in thin-film SiO2 on Si with scanning Auger electron microscope",

abstract = "Electron beam damage to thin-film SiO2 was observed with a scanning Auger electron microscope. After a certain degree of electron beam exposure, changes in both the surface topography and chemical composition were investigated. The result suggested that there is a close relationship between the beam damage and the dissipation of incident energy in thin-film SiO 2.",

author = "S. Ichimura and R. Shimizu",

year = "1979",

doi = "10.1063/1.326677",

language = "English",

volume = "50",

pages = "6020--6022",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics Publising LLC",

number = "9",

}

TY - JOUR

T1 - Observation of electron beam damage in thin-film SiO2 on Si with scanning Auger electron microscope

AU - Ichimura, S.

AU - Shimizu, R.

PY - 1979

Y1 - 1979

N2 - Electron beam damage to thin-film SiO2 was observed with a scanning Auger electron microscope. After a certain degree of electron beam exposure, changes in both the surface topography and chemical composition were investigated. The result suggested that there is a close relationship between the beam damage and the dissipation of incident energy in thin-film SiO 2.

AB - Electron beam damage to thin-film SiO2 was observed with a scanning Auger electron microscope. After a certain degree of electron beam exposure, changes in both the surface topography and chemical composition were investigated. The result suggested that there is a close relationship between the beam damage and the dissipation of incident energy in thin-film SiO 2.

UR - http://www.scopus.com/inward/record.url?scp=0038064270&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0038064270&partnerID=8YFLogxK

U2 - 10.1063/1.326677

DO - 10.1063/1.326677

M3 - Article

AN - SCOPUS:0038064270

VL - 50

SP - 6020

EP - 6022

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 9