Observation of electron beam damage in thin-film SiO2 on Si with scanning Auger electron microscope

S. Ichimura; R. Shimizu

doi:10.1063/1.326677

Observation of electron beam damage in thin-film SiO₂ on Si with scanning Auger electron microscope

S. Ichimura, R. Shimizu

Research output: Contribution to journal › Article › peer-review

26 Citations (Scopus)

Abstract

Electron beam damage to thin-film SiO₂ was observed with a scanning Auger electron microscope. After a certain degree of electron beam exposure, changes in both the surface topography and chemical composition were investigated. The result suggested that there is a close relationship between the beam damage and the dissipation of incident energy in thin-film SiO ₂.

Original language	English
Pages (from-to)	6020-6022
Number of pages	3
Journal	Journal of Applied Physics
Volume	50
Issue number	9
DOIs	https://doi.org/10.1063/1.326677
Publication status	Published - 1979 Dec 1
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy(all)

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10.1063/1.326677

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abstract = "Electron beam damage to thin-film SiO2 was observed with a scanning Auger electron microscope. After a certain degree of electron beam exposure, changes in both the surface topography and chemical composition were investigated. The result suggested that there is a close relationship between the beam damage and the dissipation of incident energy in thin-film SiO 2.",

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