Observation of electron beam damage in thin-film SiO2 on Si with scanning Auger electron microscope

S. Ichimura*, R. Shimizu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

26 Citations (Scopus)


Electron beam damage to thin-film SiO2 was observed with a scanning Auger electron microscope. After a certain degree of electron beam exposure, changes in both the surface topography and chemical composition were investigated. The result suggested that there is a close relationship between the beam damage and the dissipation of incident energy in thin-film SiO 2.

Original languageEnglish
Pages (from-to)6020-6022
Number of pages3
JournalJournal of Applied Physics
Issue number9
Publication statusPublished - 1979
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)


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