Optical exposure systems for three-dimensional fabrication of microprobe

Masayoshi Esashi, Kazuyuki Minami, Shuichi Shoji

Research output: Chapter in Book/Report/Conference proceedingConference contribution

13 Citations (Scopus)

Abstract

New optical exposure systems for patterning on nonplanar surfaces were developed. One of them is the photoresist exposure system; the other is the Parylene laser ablation system with KrF excimer laser. Microprobe multielectrodes for recording neuron impulses were fabricated with the photoresist exposure system. However, this method has the disadvantage that it is difficult to coat a nonplanar surface with photoresist uniformly. It is demonstrated that Parylene can be coated uniformly on a nonplanar surface and be patterned by a Parylene laser ablation system. A Cr line with a 10μm width on a glass plate was patterned by Parylene laser ablation and the subsequent lift-off technique. This process is useful for patterning thin film on nonplanar surfaces.

Original languageEnglish
Title of host publicationProceedings. IEEE Micro Electro Mechanical Systems
Place of PublicationPiscataway, NJ, United States
PublisherPubl by IEEE
Pages39-44
Number of pages6
ISBN (Print)0879426411
Publication statusPublished - 1991
Externally publishedYes
EventProceedings of the 1991 IEEE Micro Electro Mechanical Systems - MEMS '91 - Nara, Jpn
Duration: 1991 Jan 301991 Feb 2

Other

OtherProceedings of the 1991 IEEE Micro Electro Mechanical Systems - MEMS '91
CityNara, Jpn
Period91/1/3091/2/2

Fingerprint

Laser ablation
Photoresists
Fabrication
Excimer lasers
Neurons
Glass
Thin films

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Esashi, M., Minami, K., & Shoji, S. (1991). Optical exposure systems for three-dimensional fabrication of microprobe. In Proceedings. IEEE Micro Electro Mechanical Systems (pp. 39-44). Piscataway, NJ, United States: Publ by IEEE.

Optical exposure systems for three-dimensional fabrication of microprobe. / Esashi, Masayoshi; Minami, Kazuyuki; Shoji, Shuichi.

Proceedings. IEEE Micro Electro Mechanical Systems. Piscataway, NJ, United States : Publ by IEEE, 1991. p. 39-44.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Esashi, M, Minami, K & Shoji, S 1991, Optical exposure systems for three-dimensional fabrication of microprobe. in Proceedings. IEEE Micro Electro Mechanical Systems. Publ by IEEE, Piscataway, NJ, United States, pp. 39-44, Proceedings of the 1991 IEEE Micro Electro Mechanical Systems - MEMS '91, Nara, Jpn, 91/1/30.
Esashi M, Minami K, Shoji S. Optical exposure systems for three-dimensional fabrication of microprobe. In Proceedings. IEEE Micro Electro Mechanical Systems. Piscataway, NJ, United States: Publ by IEEE. 1991. p. 39-44
Esashi, Masayoshi ; Minami, Kazuyuki ; Shoji, Shuichi. / Optical exposure systems for three-dimensional fabrication of microprobe. Proceedings. IEEE Micro Electro Mechanical Systems. Piscataway, NJ, United States : Publ by IEEE, 1991. pp. 39-44
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