Optimal lithium targets for laser-plasma lithography

A. A. Andreev, T. Ueda, J. Limpouch

Research output: Chapter in Book/Report/Conference proceedingConference contribution

11 Citations (Scopus)

Abstract

Lithium containing droplet and cluster targets irradiated by laser pulses were proposed as prospective source for soft x-ray lithography. Laser with repetition rate of several MHz and pulse duration of 10 ps was utilized to produce required radiation x-ray lithography when an optimum target was used. Analytical model and simulations showed that of lasers with energy of several mJ was required for the purpose. The use of laser pre-pulses to enhance laser conversion into emission at desired wavelengths was also proposed.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsE.A. Dobisz
Pages789-796
Number of pages8
Volume4343
DOIs
Publication statusPublished - 2001
Externally publishedYes
EventEmerging Lithographic Technologies V - Santa Clara, CA, United States
Duration: 2001 Feb 272001 Mar 1

Other

OtherEmerging Lithographic Technologies V
CountryUnited States
CitySanta Clara, CA
Period01/2/2701/3/1

Keywords

  • Debris reduction
  • Laser-produced plasmas
  • Soft x-ray source

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

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  • Cite this

    Andreev, A. A., Ueda, T., & Limpouch, J. (2001). Optimal lithium targets for laser-plasma lithography. In E. A. Dobisz (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 4343, pp. 789-796) https://doi.org/10.1117/12.436706