Optimization of high average power FEL beam for EUV lithography application

A. Endo, Kazuyuki Sakaue, Masakazu Washio, H. Mizoguchi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

EUV source community is interested in evaluating an alternative method based on high repetition rate FEL, to avoid a risk of the potential source power limit by the plasma based technology. Present SASE FEL pulse (typically 0.1mJ, 100fs, 1 mm diameter) has higher beam fluence than the resist ablation threshold, and high spatial coherence which results in speckle and interference patterns, and random longitudinal mode spikes of high peak power micro pulses, which is not favourable to resist chemistry. This paper discusses on the required technological assessment and lowest risk approach to construct a prototype, based on superconducting linac and cryogenic undulator, to demonstrate a MHz repetition rate, high average power 13.5nm FEL equipped with specified optical components, for best optimization in EUVL application, including a scaling to 6.7nm wavelength region.

Original languageEnglish
Title of host publicationProceedings of the 36th International Free Electron Laser Conference, FEL 2014
PublisherJoint Accelerator Conferences Website (JACoW)
Pages990-992
Number of pages3
ISBN (Electronic)9783954501335
Publication statusPublished - 2014
Event36th International Free Electron Laser Conference, FEL 2014 - Basel, Switzerland
Duration: 2014 Aug 252014 Aug 29

Other

Other36th International Free Electron Laser Conference, FEL 2014
CountrySwitzerland
CityBasel
Period14/8/2514/8/29

Fingerprint

repetition
lithography
optimization
speckle patterns
pulses
spikes
ablation
cryogenics
fluence
prototypes
chemistry
interference
scaling
thresholds
wavelengths

ASJC Scopus subject areas

  • Nuclear and High Energy Physics

Cite this

Endo, A., Sakaue, K., Washio, M., & Mizoguchi, H. (2014). Optimization of high average power FEL beam for EUV lithography application. In Proceedings of the 36th International Free Electron Laser Conference, FEL 2014 (pp. 990-992). Joint Accelerator Conferences Website (JACoW).

Optimization of high average power FEL beam for EUV lithography application. / Endo, A.; Sakaue, Kazuyuki; Washio, Masakazu; Mizoguchi, H.

Proceedings of the 36th International Free Electron Laser Conference, FEL 2014. Joint Accelerator Conferences Website (JACoW), 2014. p. 990-992.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Endo, A, Sakaue, K, Washio, M & Mizoguchi, H 2014, Optimization of high average power FEL beam for EUV lithography application. in Proceedings of the 36th International Free Electron Laser Conference, FEL 2014. Joint Accelerator Conferences Website (JACoW), pp. 990-992, 36th International Free Electron Laser Conference, FEL 2014, Basel, Switzerland, 14/8/25.
Endo A, Sakaue K, Washio M, Mizoguchi H. Optimization of high average power FEL beam for EUV lithography application. In Proceedings of the 36th International Free Electron Laser Conference, FEL 2014. Joint Accelerator Conferences Website (JACoW). 2014. p. 990-992
Endo, A. ; Sakaue, Kazuyuki ; Washio, Masakazu ; Mizoguchi, H. / Optimization of high average power FEL beam for EUV lithography application. Proceedings of the 36th International Free Electron Laser Conference, FEL 2014. Joint Accelerator Conferences Website (JACoW), 2014. pp. 990-992
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