Orientational control of hexagonally packed silica mesochannels in lithographically designed confined nanospaces

Chia Wen Wu, Tetsu Ohsuna, Tomohiro Edura, Kazuyuki Kuroda

    Research output: Contribution to journalArticle

    45 Citations (Scopus)

    Abstract

    A top-down/bottom-up approach has been developed to fabricate mesoporous silica with well-aligned mesochannels of controlled orientation by means of cooperative assembly of an amphiphilic tri-block copolymer (P123) and silica species within lithographically designed confined nanospaces. Some mesochannel patterns that can be prepared by this technique are shown schematically in the picture. TEOS = tetraethoxysilane. (Figure Presented).

    Original languageEnglish
    Pages (from-to)5364-5368
    Number of pages5
    JournalAngewandte Chemie - International Edition
    Volume46
    Issue number28
    DOIs
    Publication statusPublished - 2007

    Fingerprint

    Silicon Dioxide
    Silica
    Block copolymers
    Polymers
    tetraethoxysilane

    Keywords

    • Lithography
    • Mesoporous materials
    • Nanotechnology
    • Self-assembly
    • Template synthesis

    ASJC Scopus subject areas

    • Chemistry(all)

    Cite this

    Orientational control of hexagonally packed silica mesochannels in lithographically designed confined nanospaces. / Wu, Chia Wen; Ohsuna, Tetsu; Edura, Tomohiro; Kuroda, Kazuyuki.

    In: Angewandte Chemie - International Edition, Vol. 46, No. 28, 2007, p. 5364-5368.

    Research output: Contribution to journalArticle

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