Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer

Guo Jun Zhang, Takashi Tanii, Takashi Funatsu, Iwao Ohdomari

    Research output: Contribution to journalArticle

    37 Citations (Scopus)

    Abstract

    Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epifluorescence microscopy.

    Original languageEnglish
    Pages (from-to)786-787
    Number of pages2
    JournalChemical Communications
    Volume10
    Issue number7
    Publication statusPublished - 2004 Apr 7

    Fingerprint

    Electron beam lithography
    Oligonucleotides
    Self assembled monolayers
    Silicon
    Nanostructures
    Microscopic examination
    DNA

    ASJC Scopus subject areas

    • Chemistry(all)

    Cite this

    Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer. / Zhang, Guo Jun; Tanii, Takashi; Funatsu, Takashi; Ohdomari, Iwao.

    In: Chemical Communications, Vol. 10, No. 7, 07.04.2004, p. 786-787.

    Research output: Contribution to journalArticle

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