Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer

Guo Jun Zhang, Takashi Tanii, Takashi Funatsu, Iwao Ohdomari

Research output: Contribution to journalArticle

37 Citations (Scopus)

Abstract

Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epi-fluorescence microscopy.

Original languageEnglish
Pages (from-to)786-787
Number of pages2
JournalChemical Communications
Volume4
Issue number7
DOIs
Publication statusPublished - 2004 Jan 1

ASJC Scopus subject areas

  • Catalysis
  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Chemistry(all)
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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