Percolation in implanted Si film

Atsushi Hiraiwa, Takashi Kobayashi

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The conductivity degradation of implanted Si film has been characterized by nuclear-deposited energy independently of implant conditions. The conductivity decreases as a result of the carrier density change for the nuclear-deposited energy En ≤ 1 × 1023 eV/cm3, and becomes zero with mobility for En = 2.5 × 1024 eV/cm3. These results have been investigated by the percolation theory with the assistance of the Kinchin-Pease theory. The decrease in carrier density is a result of carrier trapping by vacancy-related defects. The mobility becomes zero when the nondamaged Si cluster is localized by a heavy implantation. The calculation using the site percolation is in good agreement with the experiments, where 0.428 is assumed as the percolation threshold, and 2 as the conductivity exponent. The Si displacement energy obtained is 25 eV by comparing the theory with the experiments. The experimental results suggest that microscopically conductive domains exist even in films that are macroscopically insulating.

Original languageEnglish
Pages (from-to)309-312
Number of pages4
JournalJournal of Applied Physics
Issue number1
Publication statusPublished - 1991
Externally publishedYes


ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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