Abstract
Two different Ti-containing porous silica thin films having a hexagonal and cubic pore structure were synthesized and used as photocatalysts for the reduction of CO 2 with H 2O at 323 K. UV irradiation of the Ti-containing porous silica thin films in the presence of CO 2 and H 2O led to the formation of CH 4 and CH 3OH with a high quantum yield of 0.28%. These porous silica thin film photocatalysts having a hexagonal pore structure exhibited higher reactivity than the Ti-MCM-41 powder photocatalysts with the same pore structure.
| Original language | English |
|---|---|
| Pages (from-to) | 111-114 |
| Number of pages | 4 |
| Journal | Catalysis Letters |
| Volume | 80 |
| Issue number | 3-4 |
| DOIs | |
| Publication status | Published - 2002 Jun |
Keywords
- Formation of CH OH
- Mesoporous thin film
- Photocatalyst
- Quantum yield
- Reduction of CO
ASJC Scopus subject areas
- Physical and Theoretical Chemistry
- Catalysis