Photochemical reaction of ozone and 1,1,1,3,3,3-hexamethyldisilazane: Analysis of the gas reaction between precursors in a photochemical vapor deposition process

Ken Nakamura, Hidehiko Nonaka, Naoto Kameda, Tetsuya Nishiguchi, Shingo Ichimura

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The photochemical reaction of 1,1,1,3,3,3-hexamethyldisilazane (HMDS) and ozone (O3) in the gas phase was analyzed as the side reaction in the photochemical vapor deposition (photo-CVD) process irradiated by ultraviolet light: the analysis was conducted by Fourier-transform infrared absorption spectroscopy (FT-IR) and mass spectrometry (MS). The final products of this photochemical reaction between HMDS and O3 are CO2, N 2, and H2O, although this reaction is initiated at the Si-N-Si bond of HMDS with O3 and ultraviolet (UV) light, thus producing, as a reaction intermediate, a compound with carbonyl and/or carboxylic group followed by Si-N-Si scission.

Original languageEnglish
Pages (from-to)7349-7355
Number of pages7
JournalJapanese Journal of Applied Physics
Volume47
Issue number9 PART 1
DOIs
Publication statusPublished - 2008 Sep 12
Externally publishedYes

Fingerprint

Vapor deposition
Photochemical reactions
ultraviolet radiation
photochemical reactions
Ozone
ozone
vapor deposition
Reaction intermediates
reaction intermediates
Infrared absorption
Absorption spectroscopy
Gases
gases
infrared absorption
Mass spectrometry
cleavage
Infrared spectroscopy
Fourier transforms
absorption spectroscopy
mass spectroscopy

Keywords

  • CVD
  • HMDS
  • Infrared absorption
  • Mass spectrometry
  • Organosilane
  • Oxide
  • Ozone
  • Photodissociation
  • Photoreaction
  • SiO

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Photochemical reaction of ozone and 1,1,1,3,3,3-hexamethyldisilazane : Analysis of the gas reaction between precursors in a photochemical vapor deposition process. / Nakamura, Ken; Nonaka, Hidehiko; Kameda, Naoto; Nishiguchi, Tetsuya; Ichimura, Shingo.

In: Japanese Journal of Applied Physics, Vol. 47, No. 9 PART 1, 12.09.2008, p. 7349-7355.

Research output: Contribution to journalArticle

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