Photochemical reaction of ozone and 1,1,1,3,3,3-hexamethyldisilazane: Analysis of the gas reaction between precursors in a photochemical vapor deposition process

Ken Nakamura, Hidehiko Nonaka, Naoto Kameda, Tetsuya Nishiguchi, Shingo Ichimura

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The photochemical reaction of 1,1,1,3,3,3-hexamethyldisilazane (HMDS) and ozone (O3) in the gas phase was analyzed as the side reaction in the photochemical vapor deposition (photo-CVD) process irradiated by ultraviolet light: the analysis was conducted by Fourier-transform infrared absorption spectroscopy (FT-IR) and mass spectrometry (MS). The final products of this photochemical reaction between HMDS and O3 are CO2, N 2, and H2O, although this reaction is initiated at the Si-N-Si bond of HMDS with O3 and ultraviolet (UV) light, thus producing, as a reaction intermediate, a compound with carbonyl and/or carboxylic group followed by Si-N-Si scission.

Original languageEnglish
Pages (from-to)7349-7355
Number of pages7
JournalJapanese journal of applied physics
Volume47
Issue number9 PART 1
DOIs
Publication statusPublished - 2008 Sep 12
Externally publishedYes

Keywords

  • CVD
  • HMDS
  • Infrared absorption
  • Mass spectrometry
  • Organosilane
  • Oxide
  • Ozone
  • Photodissociation
  • Photoreaction
  • SiO

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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