Photochemical vapor deposition of amorphous silica films using disilane and perfluorosilanes: Defect structures and deposition mechanism

Hidehiko Nonaka*, Kazuo Arai, Yoshiyuki Fujino, Shingo Ichimura

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

20 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Photochemical vapor deposition of amorphous silica films using disilane and perfluorosilanes: Defect structures and deposition mechanism'. Together they form a unique fingerprint.

Physics & Astronomy