Photoemission study of the SiO2 /Si interface structure of thin oxide films on Si(100), (111), and (110) surfaces

Michio Niwano, Hitoshi Katakura, Yuki Takeda, Yuji Takakuwa, Nobuo Miyamoto, Atsushi Hiraiwa, Kunihiro Yaqi

Research output: Contribution to journalArticlepeer-review

69 Citations (Scopus)
Original languageEnglish
Pages (from-to)195-200
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume9
Issue number2
DOIs
Publication statusPublished - 1991 Mar 1
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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