The vacuum ultraviolet (VUV) light induced decomposition in alkyl monolayers was investigated. The alkylsilane monolayer was formed on the silicon substrate from otadecyltrimethoxysilane monolayer (OTSM). The photodecomposition of the alkyl monolayer was investigated under VUV irradiation conducted at 10 and 105 Pa. The photodecomposition rate at 10 5 Pa was found to be smaller than that at 10 Pa. An increase in the carboxyl coverage on the surface of silicon was observed with increasing VUV irradiation time ranging from 0 to 60 s at 10 Pa, which decreased after 60 s.
|Number of pages||5|
|Journal||Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films|
|Publication status||Published - 2004 Jul|
ASJC Scopus subject areas
- Surfaces, Coatings and Films
- Surfaces and Interfaces
- Physics and Astronomy (miscellaneous)