Photoinduced decomposition of alkyl monolayers using 172 nm vacuum ultraviolet light

Naoto Shirahata, Kotaro Oda, Shuuichi Asakura, Akio Fuwa, Yoshiyuki Yokogawa, Tetsuya Kameyama, Atsushi Hozumi

    Research output: Contribution to journalArticle

    5 Citations (Scopus)

    Abstract

    The vacuum ultraviolet (VUV) light induced decomposition in alkyl monolayers was investigated. The alkylsilane monolayer was formed on the silicon substrate from otadecyltrimethoxysilane monolayer (OTSM). The photodecomposition of the alkyl monolayer was investigated under VUV irradiation conducted at 10 and 105 Pa. The photodecomposition rate at 10 5 Pa was found to be smaller than that at 10 Pa. An increase in the carboxyl coverage on the surface of silicon was observed with increasing VUV irradiation time ranging from 0 to 60 s at 10 Pa, which decreased after 60 s.

    Original languageEnglish
    Pages (from-to)1615-1619
    Number of pages5
    JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
    Volume22
    Issue number4
    DOIs
    Publication statusPublished - 2004 Jul

    Fingerprint

    ultraviolet radiation
    Monolayers
    photodecomposition
    Vacuum
    Decomposition
    decomposition
    vacuum
    Silicon
    irradiation
    Irradiation
    silicon
    Ultraviolet Rays
    Substrates

    ASJC Scopus subject areas

    • Surfaces, Coatings and Films
    • Surfaces and Interfaces
    • Physics and Astronomy (miscellaneous)

    Cite this

    Photoinduced decomposition of alkyl monolayers using 172 nm vacuum ultraviolet light. / Shirahata, Naoto; Oda, Kotaro; Asakura, Shuuichi; Fuwa, Akio; Yokogawa, Yoshiyuki; Kameyama, Tetsuya; Hozumi, Atsushi.

    In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 22, No. 4, 07.2004, p. 1615-1619.

    Research output: Contribution to journalArticle

    Shirahata, Naoto ; Oda, Kotaro ; Asakura, Shuuichi ; Fuwa, Akio ; Yokogawa, Yoshiyuki ; Kameyama, Tetsuya ; Hozumi, Atsushi. / Photoinduced decomposition of alkyl monolayers using 172 nm vacuum ultraviolet light. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2004 ; Vol. 22, No. 4. pp. 1615-1619.
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    AU - Oda, Kotaro

    AU - Asakura, Shuuichi

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    AU - Yokogawa, Yoshiyuki

    AU - Kameyama, Tetsuya

    AU - Hozumi, Atsushi

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