Photoluminescence lifetime in silica glasses excited by vacuum ultra violet laser irradiation

Hiroyuki Nishikawa, Ryuta Nakamura, Kaya Nagasawa, Yoshimichi Ohki, Yoshimasa Hama

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Photoluminescence bands in silica glasses excited by a VUV (vacuum ultraviolet) laser (7.9 eV) are reported. Luminescence spectra of various types of silicas, prepared under different conditions, exhibit sample-to-sample variations. Several luminescence bands (1.9-eV, 2.7-eV, 3.1-eV, 4.2-eV, 4.3-eV, and 2-4-eV bands) were observed at room temperature. The 2.7-eV band, previously ascribed to a triplet-to-singlet transition of neutral oxygen vacancy, shows a slow decay rate of τ ≅ 10 ms. Relatively slow decay rates of τ ≅ 15 μs and τ ≅ 110 μs were obtained for the 1.9- and 3.1-eV bands, respectively.

Original languageEnglish
Title of host publicationProc 3 Int Conf Prop Appl Dielectr Mater
Place of PublicationPiscataway, NJ, United States
PublisherPubl by IEEE
Pages1032-1035
Number of pages4
ISBN (Print)0879425687
Publication statusPublished - 1991
Externally publishedYes
EventProceedings of the 3rd International Conference on Properties and Applications of Dielectric Materials - Tokyo, Jpn
Duration: 1991 Jul 81991 Jul 12

Other

OtherProceedings of the 3rd International Conference on Properties and Applications of Dielectric Materials
CityTokyo, Jpn
Period91/7/891/7/12

Fingerprint

Ultraviolet lasers
Laser beam effects
Fused silica
Luminescence
Photoluminescence
Vacuum
Oxygen vacancies
Silica
Temperature

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Nishikawa, H., Nakamura, R., Nagasawa, K., Ohki, Y., & Hama, Y. (1991). Photoluminescence lifetime in silica glasses excited by vacuum ultra violet laser irradiation. In Proc 3 Int Conf Prop Appl Dielectr Mater (pp. 1032-1035). Piscataway, NJ, United States: Publ by IEEE.

Photoluminescence lifetime in silica glasses excited by vacuum ultra violet laser irradiation. / Nishikawa, Hiroyuki; Nakamura, Ryuta; Nagasawa, Kaya; Ohki, Yoshimichi; Hama, Yoshimasa.

Proc 3 Int Conf Prop Appl Dielectr Mater. Piscataway, NJ, United States : Publ by IEEE, 1991. p. 1032-1035.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Nishikawa, H, Nakamura, R, Nagasawa, K, Ohki, Y & Hama, Y 1991, Photoluminescence lifetime in silica glasses excited by vacuum ultra violet laser irradiation. in Proc 3 Int Conf Prop Appl Dielectr Mater. Publ by IEEE, Piscataway, NJ, United States, pp. 1032-1035, Proceedings of the 3rd International Conference on Properties and Applications of Dielectric Materials, Tokyo, Jpn, 91/7/8.
Nishikawa H, Nakamura R, Nagasawa K, Ohki Y, Hama Y. Photoluminescence lifetime in silica glasses excited by vacuum ultra violet laser irradiation. In Proc 3 Int Conf Prop Appl Dielectr Mater. Piscataway, NJ, United States: Publ by IEEE. 1991. p. 1032-1035
Nishikawa, Hiroyuki ; Nakamura, Ryuta ; Nagasawa, Kaya ; Ohki, Yoshimichi ; Hama, Yoshimasa. / Photoluminescence lifetime in silica glasses excited by vacuum ultra violet laser irradiation. Proc 3 Int Conf Prop Appl Dielectr Mater. Piscataway, NJ, United States : Publ by IEEE, 1991. pp. 1032-1035
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