Picosecond electron-beam and synchrotron radiation pulse radiolysis for studies on electron-beam and x-ray resists

Yoichi Yoshida, Hiromi Shibata, Seiichi Tagawa, Masakazu Washio, Yoneho Tabata, Noriyuki Kouchi, Atsushi Ogata

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Picosecond electron-beam and synchrotron radiation pulse radiolysis are powerful method to study the reaction mechanism in irradiated electron beam and X-ray resists. The primary processes can be detected spectroscopically by using both pulse radiolysis systems. The details of the pulse radiolysis systems and a typical exsample of pulse radiolysis studies on the resists are introduced.

Original languageEnglish
Pages (from-to)274-281
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume1086
DOIs
Publication statusPublished - 1989 Aug 22
Externally publishedYes

Fingerprint

Radiolysis
Synchrotron Radiation
Electron Beam
Synchrotron radiation
radiolysis
Resist
Electron beams
synchrotron radiation
electron beams
X rays
pulses
x rays
Reaction Mechanism

ASJC Scopus subject areas

  • Applied Mathematics
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Computer Science Applications

Cite this

Picosecond electron-beam and synchrotron radiation pulse radiolysis for studies on electron-beam and x-ray resists. / Yoshida, Yoichi; Shibata, Hiromi; Tagawa, Seiichi; Washio, Masakazu; Tabata, Yoneho; Kouchi, Noriyuki; Ogata, Atsushi.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 1086, 22.08.1989, p. 274-281.

Research output: Contribution to journalArticle

Yoshida, Yoichi ; Shibata, Hiromi ; Tagawa, Seiichi ; Washio, Masakazu ; Tabata, Yoneho ; Kouchi, Noriyuki ; Ogata, Atsushi. / Picosecond electron-beam and synchrotron radiation pulse radiolysis for studies on electron-beam and x-ray resists. In: Proceedings of SPIE - The International Society for Optical Engineering. 1989 ; Vol. 1086. pp. 274-281.
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