Abstract
Picosecond, high average power laser is critical in the HVM EUV source technology. 100kHz, mJ, laser is realized by thin disc laser architecture for LPP, and > MHz laser is discussed for 10kW level EUV FEL.
| Original language | English |
|---|---|
| Title of host publication | Compact EUV and X-ray Light Sources, EUVXRAY 2016 |
| Publisher | OSA - The Optical Society |
| Volume | Part F14-EUVXRAY 2016 |
| ISBN (Print) | 9781943580095 |
| Publication status | Published - 2016 Mar 14 |
| Event | Compact EUV and X-ray Light Sources, EUVXRAY 2016 - Long Beach, United States Duration: 2016 Mar 20 → 2016 Mar 22 |
Other
| Other | Compact EUV and X-ray Light Sources, EUVXRAY 2016 |
|---|---|
| Country | United States |
| City | Long Beach |
| Period | 16/3/20 → 16/3/22 |
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ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Mechanics of Materials
Cite this
Picosecond, kW thin disc laser technology for LPP and FEL EUV sources. / Endo, A.; Smrz, M.; Novak, O.; Turcicova, H.; Muzik, J.; Huynh, J.; Mocek, T.; Sakaue, Kazuyuki; Washio, Masakazu.
Compact EUV and X-ray Light Sources, EUVXRAY 2016. Vol. Part F14-EUVXRAY 2016 OSA - The Optical Society, 2016. ES4A.2.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Picosecond, kW thin disc laser technology for LPP and FEL EUV sources
AU - Endo, A.
AU - Smrz, M.
AU - Novak, O.
AU - Turcicova, H.
AU - Muzik, J.
AU - Huynh, J.
AU - Mocek, T.
AU - Sakaue, Kazuyuki
AU - Washio, Masakazu
PY - 2016/3/14
Y1 - 2016/3/14
N2 - Picosecond, high average power laser is critical in the HVM EUV source technology. 100kHz, mJ, laser is realized by thin disc laser architecture for LPP, and > MHz laser is discussed for 10kW level EUV FEL.
AB - Picosecond, high average power laser is critical in the HVM EUV source technology. 100kHz, mJ, laser is realized by thin disc laser architecture for LPP, and > MHz laser is discussed for 10kW level EUV FEL.
UR - http://www.scopus.com/inward/record.url?scp=85016468958&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85016468958&partnerID=8YFLogxK
M3 - Conference contribution
SN - 9781943580095
VL - Part F14-EUVXRAY 2016
BT - Compact EUV and X-ray Light Sources, EUVXRAY 2016
PB - OSA - The Optical Society
ER -