Picosecond, kW thin disc laser technology for LPP and FEL EUV sources

A. Endo, M. Smrz, O. Novak, H. Turcicova, J. Muzik, J. Huynh, T. Mocek, K. Sakaue, M. Washio

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Picosecond, high average power laser is critical in the HVM EUV source technology. 100kHz, mJ, laser is realized by thin disc laser architecture for LPP, and > MHz laser is discussed for 10kW level EUV FEL.

Original languageEnglish
Title of host publicationCompact EUV and X-ray Light Sources, EUVXRAY 2016
PublisherOSA - The Optical Society
ISBN (Print)9781943580095
DOIs
Publication statusPublished - 2016 Mar 14
EventCompact EUV and X-ray Light Sources, EUVXRAY 2016 - Long Beach, United States
Duration: 2016 Mar 20 → 2016 Mar 22

Publication series

NameOptics InfoBase Conference Papers

Other

OtherCompact EUV and X-ray Light Sources, EUVXRAY 2016
CountryUnited States
CityLong Beach
Period16/3/20 → 16/3/22

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials

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    Endo, A., Smrz, M., Novak, O., Turcicova, H., Muzik, J., Huynh, J., Mocek, T., Sakaue, K., & Washio, M. (2016). Picosecond, kW thin disc laser technology for LPP and FEL EUV sources. In Compact EUV and X-ray Light Sources, EUVXRAY 2016 [ES4A.2] (Optics InfoBase Conference Papers). OSA - The Optical Society. https://doi.org/10.1364/euvxray.2016.es4a.2