TY - GEN
T1 - Picosecond, kW thin disc laser technology for LPP and FEL EUV sources
AU - Endo, A.
AU - Smrz, M.
AU - Novak, O.
AU - Turcicova, H.
AU - Muzik, J.
AU - Huynh, J.
AU - Mocek, T.
AU - Sakaue, K.
AU - Washio, M.
PY - 2016/3/14
Y1 - 2016/3/14
N2 - Picosecond, high average power laser is critical in the HVM EUV source technology. 100kHz, mJ, laser is realized by thin disc laser architecture for LPP, and > MHz laser is discussed for 10kW level EUV FEL.
AB - Picosecond, high average power laser is critical in the HVM EUV source technology. 100kHz, mJ, laser is realized by thin disc laser architecture for LPP, and > MHz laser is discussed for 10kW level EUV FEL.
UR - http://www.scopus.com/inward/record.url?scp=85016468958&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85016468958&partnerID=8YFLogxK
U2 - 10.1364/euvxray.2016.es4a.2
DO - 10.1364/euvxray.2016.es4a.2
M3 - Conference contribution
AN - SCOPUS:85016468958
SN - 9781943580095
T3 - Optics InfoBase Conference Papers
BT - Compact EUV and X-ray Light Sources, EUVXRAY 2016
PB - OSA - The Optical Society
T2 - Compact EUV and X-ray Light Sources, EUVXRAY 2016
Y2 - 20 March 2016 through 22 March 2016
ER -