Picosecond, kW thin disc laser technology for LPP and FEL EUV sources

A. Endo; M. Smrz; O. Novak; H. Turcicova; J. Muzik; J. Huynh; T. Mocek; K. Sakaue; M. Washio

doi:10.1364/euvxray.2016.es4a.2

Picosecond, kW thin disc laser technology for LPP and FEL EUV sources

A. Endo, M. Smrz, O. Novak, H. Turcicova, J. Muzik, J. Huynh, T. Mocek, K. Sakaue, M. Washio

School of Advanced Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Picosecond, high average power laser is critical in the HVM EUV source technology. 100kHz, mJ, laser is realized by thin disc laser architecture for LPP, and > MHz laser is discussed for 10kW level EUV FEL.

Original language	English
Title of host publication	Compact EUV and X-ray Light Sources, EUVXRAY 2016
Publisher	OSA - The Optical Society
ISBN (Print)	9781943580095
DOIs	https://doi.org/10.1364/euvxray.2016.es4a.2
Publication status	Published - 2016 Mar 14
Event	Compact EUV and X-ray Light Sources, EUVXRAY 2016 - Long Beach, United States Duration: 2016 Mar 20 → 2016 Mar 22

Publication series

Name	Optics InfoBase Conference Papers

Other

Other	Compact EUV and X-ray Light Sources, EUVXRAY 2016
Country	United States
City	Long Beach
Period	16/3/20 → 16/3/22

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Mechanics of Materials

Access to Document

10.1364/euvxray.2016.es4a.2

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Picosecond, kW thin disc laser technology for LPP and FEL EUV sources. / Endo, A.; Smrz, M.; Novak, O.; Turcicova, H.; Muzik, J.; Huynh, J.; Mocek, T.; Sakaue, K.; Washio, M.

Compact EUV and X-ray Light Sources, EUVXRAY 2016. OSA - The Optical Society, 2016. ES4A.2 (Optics InfoBase Conference Papers).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Endo, A, Smrz, M, Novak, O, Turcicova, H, Muzik, J, Huynh, J, Mocek, T, Sakaue, K & Washio, M 2016, Picosecond, kW thin disc laser technology for LPP and FEL EUV sources. in Compact EUV and X-ray Light Sources, EUVXRAY 2016., ES4A.2, Optics InfoBase Conference Papers, OSA - The Optical Society, Compact EUV and X-ray Light Sources, EUVXRAY 2016, Long Beach, United States, 16/3/20. https://doi.org/10.1364/euvxray.2016.es4a.2

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abstract = "Picosecond, high average power laser is critical in the HVM EUV source technology. 100kHz, mJ, laser is realized by thin disc laser architecture for LPP, and > MHz laser is discussed for 10kW level EUV FEL.",

author = "A. Endo and M. Smrz and O. Novak and H. Turcicova and J. Muzik and J. Huynh and T. Mocek and K. Sakaue and M. Washio",

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doi = "10.1364/euvxray.2016.es4a.2",

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AU - Muzik, J.

AU - Huynh, J.

AU - Mocek, T.

AU - Sakaue, K.

AU - Washio, M.

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