Abstract
Picosecond, high average power laser is critical in the HVM EUV source technology. 100kHz, mJ, laser is realized by thin disc laser architecture for LPP, and > MHz laser is discussed for 10kW level EUV FEL.
| Original language | English |
|---|---|
| Title of host publication | Compact EUV and X-ray Light Sources, EUVXRAY 2016 |
| Publisher | OSA - The Optical Society |
| Volume | Part F14-EUVXRAY 2016 |
| ISBN (Print) | 9781943580095 |
| Publication status | Published - 2016 Mar 14 |
| Event | Compact EUV and X-ray Light Sources, EUVXRAY 2016 - Long Beach, United States Duration: 2016 Mar 20 → 2016 Mar 22 |
Other
| Other | Compact EUV and X-ray Light Sources, EUVXRAY 2016 |
|---|---|
| Country | United States |
| City | Long Beach |
| Period | 16/3/20 → 16/3/22 |
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ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Mechanics of Materials
Cite this
Endo, A., Smrz, M., Novak, O., Turcicova, H., Muzik, J., Huynh, J., Mocek, T., Sakaue, K., & Washio, M. (2016). Picosecond, kW thin disc laser technology for LPP and FEL EUV sources. In Compact EUV and X-ray Light Sources, EUVXRAY 2016 (Vol. Part F14-EUVXRAY 2016). [ES4A.2] OSA - The Optical Society.