Pinhole-free pyrex glass etching using HF-H 2SO 4 mixed acid and its applications for a PDMS microflow system

Takahiro Arakawa, Yukiko Sato, Taro Ueno, Takashi Funatsu, Shuichi Shoji

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

Useful Pyrex glass etching method using HF and H 2SO 4 mixed acid was studied. To realize the etching behaviors of constant etch rate, high masks durability, small under cut and pinhole free, optimum composition of HF-H 2SO 4 system was found out. Pinhole-free etching, constant etching rate of 0.5 μm/min and smooth surface of less than 4.6nm was obtained at 0.8vol% HF and 32vol% H 2SO 4. This system realized high durability of the etching mask of Si, Cr/Au and even photoresists. This method is useful not only to fabricate Pyrex glass microchannels but also to make PDMS molds. We fabricated a prototype of the pneumatic actuated microvalve system for the single molecular imaging under Total Internal Reflection Fluorescence Microscopy (TIRFM). The leakage free valve actions are confirmed and the switching time of Open-Close and Close-Open modes are 100msec and 120msec respectively.

Original languageEnglish
Title of host publicationTRANSDUCERS '05 - 13th International Conference on Solid-State Sensors and Actuators and Microsystems - Digest of Technical Papers
Pages1489-1492
Number of pages4
DOIs
Publication statusPublished - 2005 Nov 9
Event13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05 - Seoul, Korea, Republic of
Duration: 2005 Jun 52005 Jun 9

Publication series

NameDigest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05
Volume2

Conference

Conference13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05
CountryKorea, Republic of
CitySeoul
Period05/6/505/6/9

Keywords

  • Microflow system
  • Mixed acid wetetching
  • PDMS microvalve
  • TIRFM

ASJC Scopus subject areas

  • Engineering(all)

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