Planar-Doping of Molecular Beam Epitaxy Grown Znse With Plasma-Excited Nitrogen

Shigeyuki Matsumoto, Hiroyuki Tosaka, Takashi Yoshida, Masakazu Kobayashi, Akihiko Yoshikawa

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

Planar doping of nitrogen into ZnSe is examined. The dependence of doping efficiency on the particular surface termination (Zn- or Se-stabilised) on (100) ZnSe is investigated through capacitance-voltage measurement and low-temperature photoluminescence (PL) spectroscopy. Using planar doping on the Zn surface, we achieved a hole concentration of 4.5 x 1017 cm-3, and the PL spectrum is dominated by strong donor-acceptor pair (DAP) emissions. By contrast, the film planar-doped on the Se plane shows rather low hole concentration, and the spectrum is dominated by excitonic features along with very weak DAP emissions.

Original languageEnglish
Pages (from-to)L229-L232
JournalJapanese journal of applied physics
Volume32
Issue number2 B
DOIs
Publication statusPublished - 1993 Feb
Externally publishedYes

Keywords

  • MBE
  • Nitrogen plasma
  • Planar doping
  • ZnSe

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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