Plasma-enhanced chemical vapor deposition and characterization of high-permittivity hafnium and zirconium silicate films

Hiromitsu Kato, Tomohiro Nango, Takeshi Miyagawa, Takahiro Katagiri, Kwang Soo Seol, Yoshimichi Ohki

    Research output: Contribution to journalArticle

    136 Citations (Scopus)

    Abstract

    Deposition of hafnium silicate films with various hafnium contents was tried by plasma-enhanced chemical vapor deposition using tetraethoxysilane and a hafnium alkoxide. From x-ray photoelectron spectroscopy, the deposited films are confirmed to be silicate with Hf-O-Si bonds but without any Hf-Si bonds. The permittivity calculated from the capacitance of the accumulation layer increases monotonically with an increase in the hafnium content, whereas the optical band gap energy estimated from vacuum ultraviolet absorption spectra decreases. Similar results were obtained from zirconium silicate films deposited using tetraethoxysilane and a zirconium alkoxide. If we compare the films with the same hafnium or zirconium content, the hafnium silicate exhibits a higher permittivity and a larger band gap energy than the zirconium silicate.

    Original languageEnglish
    Pages (from-to)1106-1111
    Number of pages6
    JournalJournal of Applied Physics
    Volume92
    Issue number2
    DOIs
    Publication statusPublished - 2002 Jul 15

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    hafnium
    silicates
    vapor deposition
    permittivity
    alkoxides
    ultraviolet absorption
    ultraviolet spectra
    x ray spectroscopy
    capacitance
    photoelectron spectroscopy
    absorption spectra
    vacuum

    ASJC Scopus subject areas

    • Physics and Astronomy(all)

    Cite this

    Plasma-enhanced chemical vapor deposition and characterization of high-permittivity hafnium and zirconium silicate films. / Kato, Hiromitsu; Nango, Tomohiro; Miyagawa, Takeshi; Katagiri, Takahiro; Seol, Kwang Soo; Ohki, Yoshimichi.

    In: Journal of Applied Physics, Vol. 92, No. 2, 15.07.2002, p. 1106-1111.

    Research output: Contribution to journalArticle

    Kato, Hiromitsu ; Nango, Tomohiro ; Miyagawa, Takeshi ; Katagiri, Takahiro ; Seol, Kwang Soo ; Ohki, Yoshimichi. / Plasma-enhanced chemical vapor deposition and characterization of high-permittivity hafnium and zirconium silicate films. In: Journal of Applied Physics. 2002 ; Vol. 92, No. 2. pp. 1106-1111.
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    AU - Nango, Tomohiro

    AU - Miyagawa, Takeshi

    AU - Katagiri, Takahiro

    AU - Seol, Kwang Soo

    AU - Ohki, Yoshimichi

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