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Plasma-enhanced chemical vapor deposition and characterization of high-permittivity hafnium and zirconium silicate films
Hiromitsu Kato*, Tomohiro Nango, Takeshi Miyagawa, Takahiro Katagiri, Kwang Soo Seol, Yoshimichi Ohki
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
138
Citations
(Scopus)