Plasma-enhanced chemical vapor deposition and characterization of high-permittivity hafnium and zirconium silicate films

Hiromitsu Kato*, Tomohiro Nango, Takeshi Miyagawa, Takahiro Katagiri, Kwang Soo Seol, Yoshimichi Ohki

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

138 Citations (Scopus)

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Physics & Astronomy