TY - GEN
T1 - Polarization-inverted multilayered pure shear mode AlN film resonator
AU - Suzuki, Masashi
AU - Yanagitani, Takahiko
PY - 2011/12/1
Y1 - 2011/12/1
N2 - c-axis parallel AlN film is suitable for pure shear mode devices. Polarization-inverted multilayered structure can excite high order mode resonance. The film thickness of high order mode resonator is thicker than that of fundamental mode resonator in same operating frequency. Therefore, the multilayered resonator is expected to have high power handling capability. c-axis parallel polarization-inverted multilayered AlN films were fabricated by ion beam assisted deposition (IBAD). caxis parallel orientation was formed under the 3 kV accelerated ion beam irradiation. Shear mode resonator was prepared to investigate piezoelectric properties of the film. Only pure shear wave without any longitudinal wave was excited in the resonators. k15 was determined to be 0.05 and this value is 71 % of the single crystalline AlN. We considered that in-plane crystal growth direction should to be determined by the ion beam irradiation direction. c-axis parallel multilayer AlN film was fabricated by inverting in-plane beam irradiation direction. High order mode resonance was observed in the resonators, showing that polarization was inverted in the multilayer AlN films.
AB - c-axis parallel AlN film is suitable for pure shear mode devices. Polarization-inverted multilayered structure can excite high order mode resonance. The film thickness of high order mode resonator is thicker than that of fundamental mode resonator in same operating frequency. Therefore, the multilayered resonator is expected to have high power handling capability. c-axis parallel polarization-inverted multilayered AlN films were fabricated by ion beam assisted deposition (IBAD). caxis parallel orientation was formed under the 3 kV accelerated ion beam irradiation. Shear mode resonator was prepared to investigate piezoelectric properties of the film. Only pure shear wave without any longitudinal wave was excited in the resonators. k15 was determined to be 0.05 and this value is 71 % of the single crystalline AlN. We considered that in-plane crystal growth direction should to be determined by the ion beam irradiation direction. c-axis parallel multilayer AlN film was fabricated by inverting in-plane beam irradiation direction. High order mode resonance was observed in the resonators, showing that polarization was inverted in the multilayer AlN films.
KW - AlN
KW - Polarizationinverted multi-layer films
KW - c-axis parallel films
KW - pure shear mode
UR - http://www.scopus.com/inward/record.url?scp=84869013222&partnerID=8YFLogxK
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U2 - 10.1109/ULTSYM.2011.0075
DO - 10.1109/ULTSYM.2011.0075
M3 - Conference contribution
AN - SCOPUS:84869013222
SN - 9781457712531
T3 - IEEE International Ultrasonics Symposium, IUS
SP - 312
EP - 315
BT - 2011 IEEE International Ultrasonics Symposium, IUS 2011
T2 - 2011 IEEE International Ultrasonics Symposium, IUS 2011
Y2 - 18 October 2011 through 21 October 2011
ER -