Polymer thin film waveguide polarizer with a-Si: H clad

Isamu Kato, Yasuyuki Sugiyama, Kotaro Sugita

Research output: Contribution to journalArticle

Abstract

A device has been fabricated by loading an a-Si:H film on a polymer thin-film optical waveguide via a low index buffer layer. As an application to an optical functional device, this structure has been investigated as to its characteristics as a TE-TM mode waveguide polarizer. The loss characteristics of each mode are studied by varying the thickness of the a-Si:H film for a slab waveguide and for a practically important three-dimensional waveguide (width of 100 μm, 50 μm, 10 μm and 5 μm). The characteristics of the structures as a TE-TM mode waveguide polarizer are investigated.

Original languageEnglish
Pages (from-to)39-45
Number of pages7
JournalElectronics and Communications in Japan, Part II: Electronics (English translation of Denshi Tsushin Gakkai Ronbunshi)
Volume71
Issue number12
Publication statusPublished - 1988 Dec

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polarizers
Polymer films
Waveguides
waveguides
Thin films
polymers
thin films
Optical waveguides
Buffer layers
optical waveguides
slabs
buffers

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Cite this

Polymer thin film waveguide polarizer with a-Si : H clad. / Kato, Isamu; Sugiyama, Yasuyuki; Sugita, Kotaro.

In: Electronics and Communications in Japan, Part II: Electronics (English translation of Denshi Tsushin Gakkai Ronbunshi), Vol. 71, No. 12, 12.1988, p. 39-45.

Research output: Contribution to journalArticle

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