Polysiloxane formation from a tetraethoxysilane-ethyl alcohol-oxalic acid system

Yoshiyuki Sugahara, Shuji Sato, Kazuyuki Kuroda, Chuzo Kato

    Research output: Contribution to journalArticle

    10 Citations (Scopus)

    Abstract

    Polysiloxane formation in a tetraethoxysilane (TEOS)-ethyl alcohol (EtOD(H))-oxalic acid (OA) system without the addition of water was investigated by 29Si nuclear magnetic resonance spectroscopy (29Si-NMR). In the system with TEOS:EtOD(H):OA = 1:6:1, considerable amounts of linear oligosiloxanes possessing only ethoxy groups formed, and (EtO)3SiOSi(OEt)3, (EtO)3SiOSi(OEt)2OSi(OEt)3, and (EtO)3Si(OSi(OEt)2)2OSi(OEt)3 were identified. When the amount of OA increased to TEOS:EtOD(H):OA = 1:6:2, the polymerization rate increased considerably. The observed Si-species scarcely possessed hydroxyls, suggesting unique siloxane formation in this system.

    Original languageEnglish
    Pages (from-to)24-29
    Number of pages6
    JournalJournal of Non-Crystalline Solids
    Volume147-148
    Issue numberC
    DOIs
    Publication statusPublished - 1992

    Fingerprint

    Siloxanes
    Oxalic Acid
    polysiloxanes
    oxalic acid
    Oxalic acid
    Silicones
    Ethanol
    ethyl alcohol
    Polymers
    siloxanes
    magnetic resonance spectroscopy
    Hydroxyl Radical
    Nuclear magnetic resonance spectroscopy
    polymerization
    Polymerization
    nuclear magnetic resonance
    tetraethoxysilane
    Water
    water

    ASJC Scopus subject areas

    • Ceramics and Composites
    • Electronic, Optical and Magnetic Materials

    Cite this

    Polysiloxane formation from a tetraethoxysilane-ethyl alcohol-oxalic acid system. / Sugahara, Yoshiyuki; Sato, Shuji; Kuroda, Kazuyuki; Kato, Chuzo.

    In: Journal of Non-Crystalline Solids, Vol. 147-148, No. C, 1992, p. 24-29.

    Research output: Contribution to journalArticle

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    abstract = "Polysiloxane formation in a tetraethoxysilane (TEOS)-ethyl alcohol (EtOD(H))-oxalic acid (OA) system without the addition of water was investigated by 29Si nuclear magnetic resonance spectroscopy (29Si-NMR). In the system with TEOS:EtOD(H):OA = 1:6:1, considerable amounts of linear oligosiloxanes possessing only ethoxy groups formed, and (EtO)3SiOSi(OEt)3, (EtO)3SiOSi(OEt)2OSi(OEt)3, and (EtO)3Si(OSi(OEt)2)2OSi(OEt)3 were identified. When the amount of OA increased to TEOS:EtOD(H):OA = 1:6:2, the polymerization rate increased considerably. The observed Si-species scarcely possessed hydroxyls, suggesting unique siloxane formation in this system.",
    author = "Yoshiyuki Sugahara and Shuji Sato and Kazuyuki Kuroda and Chuzo Kato",
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    AU - Sato, Shuji

    AU - Kuroda, Kazuyuki

    AU - Kato, Chuzo

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    N2 - Polysiloxane formation in a tetraethoxysilane (TEOS)-ethyl alcohol (EtOD(H))-oxalic acid (OA) system without the addition of water was investigated by 29Si nuclear magnetic resonance spectroscopy (29Si-NMR). In the system with TEOS:EtOD(H):OA = 1:6:1, considerable amounts of linear oligosiloxanes possessing only ethoxy groups formed, and (EtO)3SiOSi(OEt)3, (EtO)3SiOSi(OEt)2OSi(OEt)3, and (EtO)3Si(OSi(OEt)2)2OSi(OEt)3 were identified. When the amount of OA increased to TEOS:EtOD(H):OA = 1:6:2, the polymerization rate increased considerably. The observed Si-species scarcely possessed hydroxyls, suggesting unique siloxane formation in this system.

    AB - Polysiloxane formation in a tetraethoxysilane (TEOS)-ethyl alcohol (EtOD(H))-oxalic acid (OA) system without the addition of water was investigated by 29Si nuclear magnetic resonance spectroscopy (29Si-NMR). In the system with TEOS:EtOD(H):OA = 1:6:1, considerable amounts of linear oligosiloxanes possessing only ethoxy groups formed, and (EtO)3SiOSi(OEt)3, (EtO)3SiOSi(OEt)2OSi(OEt)3, and (EtO)3Si(OSi(OEt)2)2OSi(OEt)3 were identified. When the amount of OA increased to TEOS:EtOD(H):OA = 1:6:2, the polymerization rate increased considerably. The observed Si-species scarcely possessed hydroxyls, suggesting unique siloxane formation in this system.

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