TY - JOUR
T1 - Polysiloxane formation from a tetraethoxysilane-ethyl alcohol-oxalic acid system
AU - Sugahara, Yoshiyuki
AU - Sato, Shuji
AU - Kuroda, Kazuyuki
AU - Kato, Chuzo
N1 - Funding Information:
The authors wish to express their sincere thanks to S. Kim for GC-MS measurement. Y.S. would like to thank TEPCO Research Fund, Assistance of International Information Exchange, for financial support.
PY - 1992
Y1 - 1992
N2 - Polysiloxane formation in a tetraethoxysilane (TEOS)-ethyl alcohol (EtOD(H))-oxalic acid (OA) system without the addition of water was investigated by 29Si nuclear magnetic resonance spectroscopy (29Si-NMR). In the system with TEOS:EtOD(H):OA = 1:6:1, considerable amounts of linear oligosiloxanes possessing only ethoxy groups formed, and (EtO)3SiOSi(OEt)3, (EtO)3SiOSi(OEt)2OSi(OEt)3, and (EtO)3Si(OSi(OEt)2)2OSi(OEt)3 were identified. When the amount of OA increased to TEOS:EtOD(H):OA = 1:6:2, the polymerization rate increased considerably. The observed Si-species scarcely possessed hydroxyls, suggesting unique siloxane formation in this system.
AB - Polysiloxane formation in a tetraethoxysilane (TEOS)-ethyl alcohol (EtOD(H))-oxalic acid (OA) system without the addition of water was investigated by 29Si nuclear magnetic resonance spectroscopy (29Si-NMR). In the system with TEOS:EtOD(H):OA = 1:6:1, considerable amounts of linear oligosiloxanes possessing only ethoxy groups formed, and (EtO)3SiOSi(OEt)3, (EtO)3SiOSi(OEt)2OSi(OEt)3, and (EtO)3Si(OSi(OEt)2)2OSi(OEt)3 were identified. When the amount of OA increased to TEOS:EtOD(H):OA = 1:6:2, the polymerization rate increased considerably. The observed Si-species scarcely possessed hydroxyls, suggesting unique siloxane formation in this system.
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U2 - 10.1016/S0022-3093(05)80587-3
DO - 10.1016/S0022-3093(05)80587-3
M3 - Article
AN - SCOPUS:0026931720
VL - 147-148
SP - 24
EP - 29
JO - Journal of Non-Crystalline Solids
JF - Journal of Non-Crystalline Solids
SN - 0022-3093
IS - C
ER -