Polysiloxane formation from a tetraethoxysilane-ethyl alcohol-oxalic acid system

Yoshiyuki Sugahara; Shuji Sato; Kazuyuki Kuroda; Chuzo Kato

doi:10.1016/S0022-3093(05)80587-3

Polysiloxane formation from a tetraethoxysilane-ethyl alcohol-oxalic acid system

Yoshiyuki Sugahara, Shuji Sato, Kazuyuki Kuroda, Chuzo Kato

School of Advanced Science and Engineering

Research output: Contribution to journal › Article

10 Citations (Scopus)

Abstract

Polysiloxane formation in a tetraethoxysilane (TEOS)-ethyl alcohol (EtOD(H))-oxalic acid (OA) system without the addition of water was investigated by ²⁹Si nuclear magnetic resonance spectroscopy (²⁹Si-NMR). In the system with TEOS:EtOD(H):OA = 1:6:1, considerable amounts of linear oligosiloxanes possessing only ethoxy groups formed, and (EtO)₃SiOSi(OEt)₃, (EtO)₃SiOSi(OEt)₂OSi(OEt)₃, and (EtO)₃Si(OSi(OEt)₂)₂OSi(OEt)₃ were identified. When the amount of OA increased to TEOS:EtOD(H):OA = 1:6:2, the polymerization rate increased considerably. The observed Si-species scarcely possessed hydroxyls, suggesting unique siloxane formation in this system.

Original language	English
Pages (from-to)	24-29
Number of pages	6
Journal	Journal of Non-Crystalline Solids
Volume	147-148
Issue number	C
DOIs	https://doi.org/10.1016/S0022-3093(05)80587-3
Publication status	Published - 1992

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Ceramics and Composites
Condensed Matter Physics
Materials Chemistry

Access to Document

10.1016/S0022-3093(05)80587-3

Fingerprint Dive into the research topics of 'Polysiloxane formation from a tetraethoxysilane-ethyl alcohol-oxalic acid system'. Together they form a unique fingerprint.

Cite this

Sugahara, Y., Sato, S., Kuroda, K., & Kato, C. (1992). Polysiloxane formation from a tetraethoxysilane-ethyl alcohol-oxalic acid system. Journal of Non-Crystalline Solids, 147-148(C), 24-29. https://doi.org/10.1016/S0022-3093(05)80587-3

@article{e820c8f9d94f4d55a2935b0d7fad44b9,

title = "Polysiloxane formation from a tetraethoxysilane-ethyl alcohol-oxalic acid system",

abstract = "Polysiloxane formation in a tetraethoxysilane (TEOS)-ethyl alcohol (EtOD(H))-oxalic acid (OA) system without the addition of water was investigated by 29Si nuclear magnetic resonance spectroscopy (29Si-NMR). In the system with TEOS:EtOD(H):OA = 1:6:1, considerable amounts of linear oligosiloxanes possessing only ethoxy groups formed, and (EtO)3SiOSi(OEt)3, (EtO)3SiOSi(OEt)2OSi(OEt)3, and (EtO)3Si(OSi(OEt)2)2OSi(OEt)3 were identified. When the amount of OA increased to TEOS:EtOD(H):OA = 1:6:2, the polymerization rate increased considerably. The observed Si-species scarcely possessed hydroxyls, suggesting unique siloxane formation in this system.",

author = "Yoshiyuki Sugahara and Shuji Sato and Kazuyuki Kuroda and Chuzo Kato",

year = "1992",

doi = "10.1016/S0022-3093(05)80587-3",

language = "English",

volume = "147-148",

pages = "24--29",

journal = "Journal of Non-Crystalline Solids",

issn = "0022-3093",

publisher = "Elsevier",

number = "C",

}

TY - JOUR

T1 - Polysiloxane formation from a tetraethoxysilane-ethyl alcohol-oxalic acid system

AU - Sugahara, Yoshiyuki

AU - Sato, Shuji

AU - Kuroda, Kazuyuki

AU - Kato, Chuzo

PY - 1992

Y1 - 1992

N2 - Polysiloxane formation in a tetraethoxysilane (TEOS)-ethyl alcohol (EtOD(H))-oxalic acid (OA) system without the addition of water was investigated by 29Si nuclear magnetic resonance spectroscopy (29Si-NMR). In the system with TEOS:EtOD(H):OA = 1:6:1, considerable amounts of linear oligosiloxanes possessing only ethoxy groups formed, and (EtO)3SiOSi(OEt)3, (EtO)3SiOSi(OEt)2OSi(OEt)3, and (EtO)3Si(OSi(OEt)2)2OSi(OEt)3 were identified. When the amount of OA increased to TEOS:EtOD(H):OA = 1:6:2, the polymerization rate increased considerably. The observed Si-species scarcely possessed hydroxyls, suggesting unique siloxane formation in this system.

AB - Polysiloxane formation in a tetraethoxysilane (TEOS)-ethyl alcohol (EtOD(H))-oxalic acid (OA) system without the addition of water was investigated by 29Si nuclear magnetic resonance spectroscopy (29Si-NMR). In the system with TEOS:EtOD(H):OA = 1:6:1, considerable amounts of linear oligosiloxanes possessing only ethoxy groups formed, and (EtO)3SiOSi(OEt)3, (EtO)3SiOSi(OEt)2OSi(OEt)3, and (EtO)3Si(OSi(OEt)2)2OSi(OEt)3 were identified. When the amount of OA increased to TEOS:EtOD(H):OA = 1:6:2, the polymerization rate increased considerably. The observed Si-species scarcely possessed hydroxyls, suggesting unique siloxane formation in this system.

UR - http://www.scopus.com/inward/record.url?scp=0026931720&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0026931720&partnerID=8YFLogxK

U2 - 10.1016/S0022-3093(05)80587-3

DO - 10.1016/S0022-3093(05)80587-3

M3 - Article

AN - SCOPUS:0026931720

VL - 147-148

SP - 24

EP - 29

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

SN - 0022-3093

IS - C

ER -