Positive and negative dipole layer formation at high-k/SiO2 interfaces simulated by classical molecular dynamics

Kosuke Shimura, Ryota Kunugi, Atsushi Ogura, Shinichi Satoh, Jiayang Fei, Koji Kita, Takanobu Watanabe

Research output: Contribution to journalArticlepeer-review

23 Citations (Scopus)

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Engineering & Materials Science

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