Power spectrum of smoothed line-edge and line-width roughness

Atsushi Hiraiwa, Akio Nishida

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Line-edge and line-width roughness (LER and LWR) is a challenge for device variability control, especially in future devices. Actual device patterns have LER/LWR that is smoothed from the original photoresist patterns used as etching masks. In this study, the LER/LWR of these actual patterns was assumed to have a modified exponential autocorrelation function, which was smoothed by another exponential function. An analytical formula of the discrete power spectral density (PSD) of this LER/LWR was derived on the basis of the previous formula for nonsmoothed LER/LWR, for use in a PSD fitting method. The PSDs calculated using this formula excellently fit the experimental PSDs of both types of polycrystalline-silicon lines without and with sidewall spacers. Through these fittings, it was found that the actual LER/LWR is accurately characterized using the variance and correlation length of the original non-smoothed LER/LWR simply by introducing a third parameter that characterizes the smoothing effect.

Original languageEnglish
Article number086502
JournalJapanese Journal of Applied Physics
Volume50
Issue number8 PART 1
DOIs
Publication statusPublished - 2011 Aug

Fingerprint

Power spectral density
Power spectrum
Linewidth
power spectra
roughness
Surface roughness
Exponential functions
Photoresists
Autocorrelation
Polysilicon
Masks
Etching
exponential functions
photoresists
smoothing
spacers
autocorrelation
masks
etching
silicon

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Power spectrum of smoothed line-edge and line-width roughness. / Hiraiwa, Atsushi; Nishida, Akio.

In: Japanese Journal of Applied Physics, Vol. 50, No. 8 PART 1, 086502, 08.2011.

Research output: Contribution to journalArticle

Hiraiwa, Atsushi ; Nishida, Akio. / Power spectrum of smoothed line-edge and line-width roughness. In: Japanese Journal of Applied Physics. 2011 ; Vol. 50, No. 8 PART 1.
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