Prediction of resist sensitivity for 13.5 nm EUV and 6.x nm EUV extension from sensitivity for EBL

Tomoko G. Oyama, Akihiro Oshima, Dang Tuan Nguyen, Satoshi Enomoto, Masakazu Washio, Seiichi Tagawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

9 Citations (Scopus)

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