Abstract
A novel fabrication process of silicon microstructure array for preferential immobilization of biomolecules is proposed. We perform electron beam lithography on a self-assembled monolayer (SAM), and achieve high-density silicon patterns terminated with both 3-aminopropyltriethoxysilane (APTES) and octadecyltrimethoxysilane (ODS). The amino-terminated surface produces the site-directed covalent immobilization of DNA inside the pattern, while the hydrophobic surface of the ODS-SAM prevents the adsorption. As a result, we have succeeded in immobilizing the DNA within the amino-modified area. By using this methodology, we demonstrate the miniaturization of deoxyribonucleic acid (DNA) chip. After the covalent attachment of the amino-modified oligonucleotides to the microstructures, we hybridize the immobilized DNA with the target DNA labeled with a fluorescent dye. The signals from the DNA chip exhibit the specific binding due to the DNA-DNA interaction. These results show the feasibility of this technique for high-density information storage and biochip miniaturization.
Original language | English |
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Pages (from-to) | 102-106 |
Number of pages | 5 |
Journal | Applied Surface Science |
Volume | 234 |
Issue number | 1-4 |
DOIs | |
Publication status | Published - 2004 Jul 15 |
Event | The Ninth International Conference on the Formation of Semicon - Madrid, Spain Duration: 2003 Sep 15 → 2003 Sep 19 |
Keywords
- Biochip
- DNA
- Deoxyribonucleic acid
- EB
- Immobilization
- Lithography
- SAM
- Self-assembled monolayer
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Surfaces, Coatings and Films