Preferential immobilization of biomolecules on silicon microstructure array by means of electron beam lithography on organosilane self-assembled monolayer resist

Takashi Tanii, Takumi Hosaka, Takeo Miyake, Guo Jun Zhang, Tamotsu Zako, Takashi Funatsu, Iwao Ohdomari

Research output: Contribution to journalConference article

25 Citations (Scopus)

Abstract

A novel fabrication process of silicon microstructure array for preferential immobilization of biomolecules is proposed. We perform electron beam lithography on a self-assembled monolayer (SAM), and achieve high-density silicon patterns terminated with both 3-aminopropyltriethoxysilane (APTES) and octadecyltrimethoxysilane (ODS). The amino-terminated surface produces the site-directed covalent immobilization of DNA inside the pattern, while the hydrophobic surface of the ODS-SAM prevents the adsorption. As a result, we have succeeded in immobilizing the DNA within the amino-modified area. By using this methodology, we demonstrate the miniaturization of deoxyribonucleic acid (DNA) chip. After the covalent attachment of the amino-modified oligonucleotides to the microstructures, we hybridize the immobilized DNA with the target DNA labeled with a fluorescent dye. The signals from the DNA chip exhibit the specific binding due to the DNA-DNA interaction. These results show the feasibility of this technique for high-density information storage and biochip miniaturization.

Original languageEnglish
Pages (from-to)102-106
Number of pages5
JournalApplied Surface Science
Volume234
Issue number1-4
DOIs
Publication statusPublished - 2004 Jul 15
EventThe Ninth International Conference on the Formation of Semicon - Madrid, Spain
Duration: 2003 Sep 152003 Sep 19

Keywords

  • Biochip
  • DNA
  • Deoxyribonucleic acid
  • EB
  • Immobilization
  • Lithography
  • SAM
  • Self-assembled monolayer

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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