Preparation of a well-defined ammo-terminated self-assembled monolayer and copper microlines on a polyimide substrate covered with an oxide nanoskin

Engineering & Materials Science

• Adsorption 5%
• Atomic force microscopy 14%
• Chemical vapor deposition 6%
• Colloids 8%
• Contact angle 6%
• Copper 52%
• Deposits 5%
• Electroless plating 7%
• Friction 8%
• Interfacial energy 14%
• Metallizing 6%
• Microscopic examination 6%
• Molecules 17%
• Oxides 55%
• Palladium 7%
• Photooxidation 10%
• Plating 6%
• Polyimides 75%
• Self assembled monolayers 100%
• Silica 12%
• Substrates 45%
• Surface morphology 6%
• Surface properties 5%
• Toluene 7%
• Vacuum 5%
• Vapors 5%
• X ray photoelectron spectroscopy 14%

Physics & Astronomy

• adsorption 4%
• atomic force microscopy 8%
• colloids 5%
• copper 45%
• deposits 5%
• friction 9%
• microscopy 4%
• molecules 9%
• oxides 39%
• packing density 7%
• palladium 6%
• photoelectron spectroscopy 9%
• photooxidation 7%
• plating 12%
• polyimides 66%
• preparation 46%
• reactivity 5%
• silicon dioxide 8%
• surface energy 11%
• surface properties 5%
• toluene 6%
• ultraviolet radiation 5%
• vacuum 3%
• vapor deposition 4%
• vapors 4%
• x rays 5%

Chemical Compounds

• Adsorption Behavior 5%
• Atomic Force Microscopy 9%
• Chemical Vapour Deposition 5%
• Colloid 5%
• Interfacial Energy 11%
• Lateral Force Microscopy 9%
• Molecule 6%
• Monolayer 4%
• Oxide 34%
• Palladium 4%
• Photooxidation 6%
• Polyimide Macromolecule 62%
• Self Assembled Monolayer 62%
• Silicon Dioxide 7%
• Surface 9%
• Time 2%
• Toluene 4%
• Vacuum 4%
• X-Ray Photoelectron Spectroscopy 8%