Preparation of aluminum-containing self-standing mesoporous silica films

Naoki Shimura, Makoto Ogawa

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Siliceous and aluminum-containing self-standing mesoporous silica films with the thickness of ca. 50 μm were synthesized by the solvent evaporation method from tetramethoxysilane, aluminum chloride hexahydrate, and octadecyltrimethylammonium chloride. The films possessed highly ordered mesostructures and large surface areas (over ca. 700 m2 g -1). The mesostructures of the products were controlled by the chemical compositions (Si/surfactant); siliceous mesostructured materials With hexagonal (P6m) and cubic (Pm3n) phases were obtained when the molar Si/surfactant ratios were 9 and 8, respectively. The aluminum-containing films with the molar Si/Al ratios of 50, 20, and 10 were also synthesized.

Original languageEnglish
Pages (from-to)1599-1606
Number of pages8
JournalBulletin of the Chemical Society of Japan
Volume77
Issue number8
DOIs
Publication statusPublished - 2004 Aug

ASJC Scopus subject areas

  • Chemistry(all)

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