Preparation of electrodeposited Pt nano patterned electrode using UV-nano imprinting lithography

M. Saito*, J. Mizuno, H. Nishikubo, H. Fujiwara, T. Homma

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)


We attempt to prepare the patterned electrode for the formation of nano particles using electrochemical deposition with the cathode whose surface has nano dot patterns. In particular, we applied electrodeposition of Pt and UV nano imprinting lithography (UV-NIL) to prepare the nano patterned electrode. In order to achieve higher activity, the deposition condition of Pt was optimized using additives such as polyethylene glycol (PEG). The surface activity of the Pt films was affected by molecular weight of PEG. It was revealed that the surface activity of the films deposited with the order of thousands of molecular weight of PEG indicated the highest effective current density among the examined films. The Pt films, which exhibited the highest current density, were adapted to fabricate nano-patterned electrode with 400 nm pith periodic structure using UV-NIL.

Original languageEnglish
Title of host publicationECS Transactions - Nanotechnology - General - 214th ECS Meeting/PRiME 2008
Number of pages6
Publication statusPublished - 2009 Nov 23
EventNanotechnology - General - 214th ECS Meeting/PRiME 2008 - Honolulu, HI, United States
Duration: 2008 Oct 122008 Oct 17

Publication series

NameECS Transactions
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737


ConferenceNanotechnology - General - 214th ECS Meeting/PRiME 2008
Country/TerritoryUnited States
CityHonolulu, HI

ASJC Scopus subject areas

  • Engineering(all)


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