TY - GEN
T1 - Preparation of electrodeposited Pt nano patterned electrode using UV-nano imprinting lithography
AU - Saito, M.
AU - Mizuno, J.
AU - Nishikubo, H.
AU - Fujiwara, H.
AU - Homma, T.
PY - 2009/11/23
Y1 - 2009/11/23
N2 - We attempt to prepare the patterned electrode for the formation of nano particles using electrochemical deposition with the cathode whose surface has nano dot patterns. In particular, we applied electrodeposition of Pt and UV nano imprinting lithography (UV-NIL) to prepare the nano patterned electrode. In order to achieve higher activity, the deposition condition of Pt was optimized using additives such as polyethylene glycol (PEG). The surface activity of the Pt films was affected by molecular weight of PEG. It was revealed that the surface activity of the films deposited with the order of thousands of molecular weight of PEG indicated the highest effective current density among the examined films. The Pt films, which exhibited the highest current density, were adapted to fabricate nano-patterned electrode with 400 nm pith periodic structure using UV-NIL.
AB - We attempt to prepare the patterned electrode for the formation of nano particles using electrochemical deposition with the cathode whose surface has nano dot patterns. In particular, we applied electrodeposition of Pt and UV nano imprinting lithography (UV-NIL) to prepare the nano patterned electrode. In order to achieve higher activity, the deposition condition of Pt was optimized using additives such as polyethylene glycol (PEG). The surface activity of the Pt films was affected by molecular weight of PEG. It was revealed that the surface activity of the films deposited with the order of thousands of molecular weight of PEG indicated the highest effective current density among the examined films. The Pt films, which exhibited the highest current density, were adapted to fabricate nano-patterned electrode with 400 nm pith periodic structure using UV-NIL.
UR - http://www.scopus.com/inward/record.url?scp=70449686402&partnerID=8YFLogxK
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U2 - 10.1149/1.3115532
DO - 10.1149/1.3115532
M3 - Conference contribution
AN - SCOPUS:70449686402
SN - 9781615672998
T3 - ECS Transactions
SP - 131
EP - 136
BT - ECS Transactions - Nanotechnology - General - 214th ECS Meeting/PRiME 2008
T2 - Nanotechnology - General - 214th ECS Meeting/PRiME 2008
Y2 - 12 October 2008 through 17 October 2008
ER -