Pressure measurement method using laser ionization for xhv

K. Kokubun; S. Ichimura; H. Shimizu; S. Sekine

doi:10.1016/0042-207X(93)90118-T

Pressure measurement method using laser ionization for xhv

K. Kokubun^*, S. Ichimura, H. Shimizu, S. Sekine

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

A pressure measurement method for xhv using laser ionization has been developed. By means of nonresonant multiphonon ionization, the proportional relation between the amount of laser-generated ions and the gas pressure is experimentally verified in the range 1 × 10^-3-2 × 10^-8 Pa. Also, a nonresonant 4-photon ionization of the He atom, which has the highest ionization potential of all atoms and molecules, and saturations of ionization for Xe, Kr, O₂ and especially for H₂, which is a main residual molecule in uhv and xhv, are successfully observed. In addition, a high-sensitivity ion-detection system for the exact measurement of several atoms and molecules in xhv is prepared. Noise due to scattered laser light is discussed.

Original language	English
Pages (from-to)	657-659
Number of pages	3
Journal	Vacuum
Volume	44
Issue number	5-7
DOIs	https://doi.org/10.1016/0042-207X(93)90118-T
Publication status	Published - 1993 Jan 1
Externally published	Yes

ASJC Scopus subject areas

Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films

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10.1016/0042-207X(93)90118-T

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title = "Pressure measurement method using laser ionization for xhv",

abstract = "A pressure measurement method for xhv using laser ionization has been developed. By means of nonresonant multiphonon ionization, the proportional relation between the amount of laser-generated ions and the gas pressure is experimentally verified in the range 1 × 10-3-2 × 10-8 Pa. Also, a nonresonant 4-photon ionization of the He atom, which has the highest ionization potential of all atoms and molecules, and saturations of ionization for Xe, Kr, O2 and especially for H2, which is a main residual molecule in uhv and xhv, are successfully observed. In addition, a high-sensitivity ion-detection system for the exact measurement of several atoms and molecules in xhv is prepared. Noise due to scattered laser light is discussed.",

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T1 - Pressure measurement method using laser ionization for xhv

AU - Kokubun, K.

AU - Ichimura, S.

AU - Shimizu, H.

AU - Sekine, S.

PY - 1993/1/1

Y1 - 1993/1/1

N2 - A pressure measurement method for xhv using laser ionization has been developed. By means of nonresonant multiphonon ionization, the proportional relation between the amount of laser-generated ions and the gas pressure is experimentally verified in the range 1 × 10-3-2 × 10-8 Pa. Also, a nonresonant 4-photon ionization of the He atom, which has the highest ionization potential of all atoms and molecules, and saturations of ionization for Xe, Kr, O2 and especially for H2, which is a main residual molecule in uhv and xhv, are successfully observed. In addition, a high-sensitivity ion-detection system for the exact measurement of several atoms and molecules in xhv is prepared. Noise due to scattered laser light is discussed.

AB - A pressure measurement method for xhv using laser ionization has been developed. By means of nonresonant multiphonon ionization, the proportional relation between the amount of laser-generated ions and the gas pressure is experimentally verified in the range 1 × 10-3-2 × 10-8 Pa. Also, a nonresonant 4-photon ionization of the He atom, which has the highest ionization potential of all atoms and molecules, and saturations of ionization for Xe, Kr, O2 and especially for H2, which is a main residual molecule in uhv and xhv, are successfully observed. In addition, a high-sensitivity ion-detection system for the exact measurement of several atoms and molecules in xhv is prepared. Noise due to scattered laser light is discussed.

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Pressure measurement method using laser ionization for xhv

Abstract

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