Production of nanopatterns by a combination of electron beam lithography and a self-assembled monolayer for an antibody nanoarray

Guo Jun Zhang, Takashi Tanii, Yuzo Kanari, Iwao Ohdomari

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22 Citations (Scopus)


We report on a flexible method of producing antibody (IgG) nanopatterns by combining electron beam (EB) lithography and a perfluorodecyltriethoxysilane (FDTES) self-assembled monolayer (SAM). Using EB lithography of the FDTES SAM, we easily fabricated IgG patterns with feature sizes on the order of 100 nm. The patterned IgG retained its ability to interact specifically with an anti-lgG. The influence of different concentrations of the IgG and anti-IgG on the resulting fluorescent IgG arrays was investigated. These IgG nanopatterns appeared to be remarkably well controlled and showed almost no detectable nonspecific binding of proteins on a hydrophobic SAM under a suitable incubation condition, characterized by atomic force microscopy, and epi-fluorescence microscopy. The technique enables the realization of high-throughput protein nanoscale arrays with high specificity.

Original languageEnglish
Pages (from-to)410-417
Number of pages8
JournalJournal of Nanoscience and Nanotechnology
Issue number2
Publication statusPublished - 2007 Feb 1



  • Antibody
  • Attachment
  • Electron beam lithography
  • Nanopatterns
  • Self-assembled monolayers
  • Silicon

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics

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