Properties of M-AFM probe affected by nanostructural metal coatings

Atsushi Hosoi, M. Hamada, A. Fujimoto, Y. Ju

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

In order to develop a new structure microwave probe, the fabrication of the atomic force microscope (AFM) probe on a GaAs wafer was studied and characteristics of the AFM probe with different nanostructural metal coating were evaluated in order to understand the performance of the probe for the topography of materials and the propagation of microwave signals. A waveguide was introduced by the sputtering and the electron beam (EB) evaporation technique on the top and bottom surfaces of the GaAs AFM probe with Au or Al film. The open structure of the waveguide at the tip of the probe was introduced by using focused ion beam fabrication. It was found that the fabricated probes coated with the Au or Al film have nanometer order resolution. Moreover, using the Au-coating probe formed by the EB evaporation technique, microwave emission was detected successfully at the tip of the probe by approaching an Au film sample.

Original languageEnglish
Pages (from-to)1233-1237
Number of pages5
JournalMicrosystem Technologies
Volume16
Issue number7
DOIs
Publication statusPublished - 2010 Jul
Externally publishedYes

Fingerprint

metal coatings
Metal coatings
Microscopes
microscopes
probes
Microwaves
Electron beams
microwave probes
Evaporation
evaporation
Waveguides
electron beams
waveguides
microwave emission
fabrication
Fabrication
Focused ion beams
Topography
topography
Sputtering

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Hardware and Architecture
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Properties of M-AFM probe affected by nanostructural metal coatings. / Hosoi, Atsushi; Hamada, M.; Fujimoto, A.; Ju, Y.

In: Microsystem Technologies, Vol. 16, No. 7, 07.2010, p. 1233-1237.

Research output: Contribution to journalArticle

Hosoi, Atsushi ; Hamada, M. ; Fujimoto, A. ; Ju, Y. / Properties of M-AFM probe affected by nanostructural metal coatings. In: Microsystem Technologies. 2010 ; Vol. 16, No. 7. pp. 1233-1237.
@article{933f423c0e3848a9bb477854fe0b5a4d,
title = "Properties of M-AFM probe affected by nanostructural metal coatings",
abstract = "In order to develop a new structure microwave probe, the fabrication of the atomic force microscope (AFM) probe on a GaAs wafer was studied and characteristics of the AFM probe with different nanostructural metal coating were evaluated in order to understand the performance of the probe for the topography of materials and the propagation of microwave signals. A waveguide was introduced by the sputtering and the electron beam (EB) evaporation technique on the top and bottom surfaces of the GaAs AFM probe with Au or Al film. The open structure of the waveguide at the tip of the probe was introduced by using focused ion beam fabrication. It was found that the fabricated probes coated with the Au or Al film have nanometer order resolution. Moreover, using the Au-coating probe formed by the EB evaporation technique, microwave emission was detected successfully at the tip of the probe by approaching an Au film sample.",
author = "Atsushi Hosoi and M. Hamada and A. Fujimoto and Y. Ju",
year = "2010",
month = "7",
doi = "10.1007/s00542-009-0957-4",
language = "English",
volume = "16",
pages = "1233--1237",
journal = "Microsystem Technologies",
issn = "0946-7076",
publisher = "Springer Verlag",
number = "7",

}

TY - JOUR

T1 - Properties of M-AFM probe affected by nanostructural metal coatings

AU - Hosoi, Atsushi

AU - Hamada, M.

AU - Fujimoto, A.

AU - Ju, Y.

PY - 2010/7

Y1 - 2010/7

N2 - In order to develop a new structure microwave probe, the fabrication of the atomic force microscope (AFM) probe on a GaAs wafer was studied and characteristics of the AFM probe with different nanostructural metal coating were evaluated in order to understand the performance of the probe for the topography of materials and the propagation of microwave signals. A waveguide was introduced by the sputtering and the electron beam (EB) evaporation technique on the top and bottom surfaces of the GaAs AFM probe with Au or Al film. The open structure of the waveguide at the tip of the probe was introduced by using focused ion beam fabrication. It was found that the fabricated probes coated with the Au or Al film have nanometer order resolution. Moreover, using the Au-coating probe formed by the EB evaporation technique, microwave emission was detected successfully at the tip of the probe by approaching an Au film sample.

AB - In order to develop a new structure microwave probe, the fabrication of the atomic force microscope (AFM) probe on a GaAs wafer was studied and characteristics of the AFM probe with different nanostructural metal coating were evaluated in order to understand the performance of the probe for the topography of materials and the propagation of microwave signals. A waveguide was introduced by the sputtering and the electron beam (EB) evaporation technique on the top and bottom surfaces of the GaAs AFM probe with Au or Al film. The open structure of the waveguide at the tip of the probe was introduced by using focused ion beam fabrication. It was found that the fabricated probes coated with the Au or Al film have nanometer order resolution. Moreover, using the Au-coating probe formed by the EB evaporation technique, microwave emission was detected successfully at the tip of the probe by approaching an Au film sample.

UR - http://www.scopus.com/inward/record.url?scp=77955850684&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77955850684&partnerID=8YFLogxK

U2 - 10.1007/s00542-009-0957-4

DO - 10.1007/s00542-009-0957-4

M3 - Article

VL - 16

SP - 1233

EP - 1237

JO - Microsystem Technologies

JF - Microsystem Technologies

SN - 0946-7076

IS - 7

ER -