PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY.

H. Tanino, K. Hoh, M. Hirata, N. Atoda, Shingo Ichimura

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Novel methods are proposed to enlarge the vertical (normal to the plane of electron orbit) width of the exposed area in synchrotron radiation (SR) lithography. They are the shaping of the cross section of the SR beam by a fixed toroidal mirror with specified parameters and the superposition of the reflected SR beams from fixed planar mirrors onto the upper and lower peripheries of the straight beam. An experimental verification is presented, and merits and demerits of these methods are compared with those of other methods.

Original languageEnglish
Title of host publicationJournal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
Pages232-236
Number of pages5
Volume3
Edition1
DOIs
Publication statusPublished - 1984 Jan 1
Externally publishedYes
EventProc of the 1984 Int Symp on Electron, Ion, and Photon Beams - Tarrytown, NY, USA
Duration: 1984 May 291984 Jun 1

Other

OtherProc of the 1984 Int Symp on Electron, Ion, and Photon Beams
CityTarrytown, NY, USA
Period84/5/2984/6/1

Fingerprint

Synchrotron radiation
Lithography
Experiments
Mirrors
Orbits
Electrons

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Tanino, H., Hoh, K., Hirata, M., Atoda, N., & Ichimura, S. (1984). PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY. In Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena (1 ed., Vol. 3, pp. 232-236) https://doi.org/10.1116/1.583234

PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY. / Tanino, H.; Hoh, K.; Hirata, M.; Atoda, N.; Ichimura, Shingo.

Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena. Vol. 3 1. ed. 1984. p. 232-236.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Tanino, H, Hoh, K, Hirata, M, Atoda, N & Ichimura, S 1984, PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY. in Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena. 1 edn, vol. 3, pp. 232-236, Proc of the 1984 Int Symp on Electron, Ion, and Photon Beams, Tarrytown, NY, USA, 84/5/29. https://doi.org/10.1116/1.583234
Tanino H, Hoh K, Hirata M, Atoda N, Ichimura S. PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY. In Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena. 1 ed. Vol. 3. 1984. p. 232-236 https://doi.org/10.1116/1.583234
Tanino, H. ; Hoh, K. ; Hirata, M. ; Atoda, N. ; Ichimura, Shingo. / PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY. Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena. Vol. 3 1. ed. 1984. pp. 232-236
@inproceedings{ec008c3cff1d42709d1a8c3473d6f7a8,
title = "PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY.",
abstract = "Novel methods are proposed to enlarge the vertical (normal to the plane of electron orbit) width of the exposed area in synchrotron radiation (SR) lithography. They are the shaping of the cross section of the SR beam by a fixed toroidal mirror with specified parameters and the superposition of the reflected SR beams from fixed planar mirrors onto the upper and lower peripheries of the straight beam. An experimental verification is presented, and merits and demerits of these methods are compared with those of other methods.",
author = "H. Tanino and K. Hoh and M. Hirata and N. Atoda and Shingo Ichimura",
year = "1984",
month = "1",
day = "1",
doi = "10.1116/1.583234",
language = "English",
isbn = "0883184648",
volume = "3",
pages = "232--236",
booktitle = "Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena",
edition = "1",

}

TY - GEN

T1 - PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY.

AU - Tanino, H.

AU - Hoh, K.

AU - Hirata, M.

AU - Atoda, N.

AU - Ichimura, Shingo

PY - 1984/1/1

Y1 - 1984/1/1

N2 - Novel methods are proposed to enlarge the vertical (normal to the plane of electron orbit) width of the exposed area in synchrotron radiation (SR) lithography. They are the shaping of the cross section of the SR beam by a fixed toroidal mirror with specified parameters and the superposition of the reflected SR beams from fixed planar mirrors onto the upper and lower peripheries of the straight beam. An experimental verification is presented, and merits and demerits of these methods are compared with those of other methods.

AB - Novel methods are proposed to enlarge the vertical (normal to the plane of electron orbit) width of the exposed area in synchrotron radiation (SR) lithography. They are the shaping of the cross section of the SR beam by a fixed toroidal mirror with specified parameters and the superposition of the reflected SR beams from fixed planar mirrors onto the upper and lower peripheries of the straight beam. An experimental verification is presented, and merits and demerits of these methods are compared with those of other methods.

UR - http://www.scopus.com/inward/record.url?scp=0021188877&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0021188877&partnerID=8YFLogxK

U2 - 10.1116/1.583234

DO - 10.1116/1.583234

M3 - Conference contribution

AN - SCOPUS:0021188877

SN - 0883184648

VL - 3

SP - 232

EP - 236

BT - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

ER -