PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY.

H. Tanino; K. Hoh; M. Hirata; N. Atoda; S. Ichimura

doi:10.1116/1.583234

PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY.

H. Tanino^*, K. Hoh, M. Hirata, N. Atoda, S. Ichimura

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Novel methods are proposed to enlarge the vertical (normal to the plane of electron orbit) width of the exposed area in synchrotron radiation (SR) lithography. They are the shaping of the cross section of the SR beam by a fixed toroidal mirror with specified parameters and the superposition of the reflected SR beams from fixed planar mirrors onto the upper and lower peripheries of the straight beam. An experimental verification is presented, and merits and demerits of these methods are compared with those of other methods.

Original language	English
Title of host publication	Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
Pages	232-236
Number of pages	5
Volume	3
Edition	1
DOIs	https://doi.org/10.1116/1.583234
Publication status	Published - 1984 Jan
Externally published	Yes
Event	Proc of the 1984 Int Symp on Electron, Ion, and Photon Beams - Tarrytown, NY, USA Duration: 1984 May 29 → 1984 Jun 1

Other

Other	Proc of the 1984 Int Symp on Electron, Ion, and Photon Beams
City	Tarrytown, NY, USA
Period	84/5/29 → 84/6/1

ASJC Scopus subject areas

Engineering(all)

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10.1116/1.583234

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Tanino, H, Hoh, K, Hirata, M, Atoda, N & Ichimura, S 1984, PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY. in Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena. 1 edn, vol. 3, pp. 232-236, Proc of the 1984 Int Symp on Electron, Ion, and Photon Beams, Tarrytown, NY, USA, 84/5/29. https://doi.org/10.1116/1.583234

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AB - Novel methods are proposed to enlarge the vertical (normal to the plane of electron orbit) width of the exposed area in synchrotron radiation (SR) lithography. They are the shaping of the cross section of the SR beam by a fixed toroidal mirror with specified parameters and the superposition of the reflected SR beams from fixed planar mirrors onto the upper and lower peripheries of the straight beam. An experimental verification is presented, and merits and demerits of these methods are compared with those of other methods.

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PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY.

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