PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY.

H. Tanino, K. Hoh, M. Hirata, N. Atoda, S. Ichimura

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Novel methods are proposed to enlarge the vertical (normal to the plane of electron orbit) width of the exposed area in synchrotron radiation (SR) lithography. They are the shaping of the cross section of the SR beam by a fixed toroidal mirror with specified parameters and the superposition of the reflected SR beams from fixed planar mirrors onto the upper and lower peripheries of the straight beam. An experimental verification is presented, and merits and demerits of these methods are compared with those of other methods.

Original languageEnglish
Title of host publicationJournal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
Pages232-236
Number of pages5
Volume3
Edition1
DOIs
Publication statusPublished - 1984 Jan 1
Externally publishedYes
EventProc of the 1984 Int Symp on Electron, Ion, and Photon Beams - Tarrytown, NY, USA
Duration: 1984 May 291984 Jun 1

Other

OtherProc of the 1984 Int Symp on Electron, Ion, and Photon Beams
CityTarrytown, NY, USA
Period84/5/2984/6/1

ASJC Scopus subject areas

  • Engineering(all)

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  • Cite this

    Tanino, H., Hoh, K., Hirata, M., Atoda, N., & Ichimura, S. (1984). PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY. In Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena (1 ed., Vol. 3, pp. 232-236) https://doi.org/10.1116/1.583234