Pulse mode effects on crystallization temperature of titanium dioxide films in pulse magnetron sputtering

Takahira Miyagi, Masayuki Kamei, Tomoyuki Ogawa, Takefumi Mitsuhashi, Atsushi Yamazaki, Tetsuya Sato

Research output: Contribution to journalConference article

30 Citations (Scopus)

Abstract

Pulse mode effects on the crystallization temperature and photocatalytic properties of TiO2 films were investigated. TiO2 films were deposited on silica glass substrates using a pulse magnetron sputtering apparatus in the unipolar and the bipolar pulse modes. X-Ray diffraction showed that in the bipolar pulse mode the rutile phase TiO2 film grew at lower substrate temperature compared with the unipolar pulse mode. The photocatalytic activities obtained from the photoreduction of Ag ions at the surface of TiO2 films indicated that the anatase phase TiO 2 films grown in the bipolar pulse mode had higher photocatalytic activity compared with those grown in the unipolar pulse mode. This suggests that the bipolar pulse mode is an effective technique to achieve higher photocatalytic activity of TiO2 film.

Original languageEnglish
Pages (from-to)32-35
Number of pages4
JournalThin Solid Films
Volume442
Issue number1-2
DOIs
Publication statusPublished - 2003 Oct 1
EventSelected Papers from the 4th International COnference on Coating - Braunschweig, Germany
Duration: 2002 Nov 32002 Nov 7

    Fingerprint

Keywords

  • Crystallization
  • Photocatalyst
  • Sputtering
  • Titanium oxide

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this