Pulse mode effects on crystallization temperature of titanium dioxide films in pulse magnetron sputtering

Takahira Miyagi, Masayuki Kamei, Tomoyuki Ogawa, Takefumi Mitsuhashi, Atsushi Yamazaki, Tetsuya Sato

    Research output: Contribution to journalArticle

    30 Citations (Scopus)

    Abstract

    Pulse mode effects on the crystallization temperature and photocatalytic properties of TiO2 films were investigated. TiO2 films were deposited on silica glass substrates using a pulse magnetron sputtering apparatus in the unipolar and the bipolar pulse modes. X-Ray diffraction showed that in the bipolar pulse mode the rutile phase TiO2 film grew at lower substrate temperature compared with the unipolar pulse mode. The photocatalytic activities obtained from the photoreduction of Ag ions at the surface of TiO2 films indicated that the anatase phase TiO 2 films grown in the bipolar pulse mode had higher photocatalytic activity compared with those grown in the unipolar pulse mode. This suggests that the bipolar pulse mode is an effective technique to achieve higher photocatalytic activity of TiO2 film.

    Original languageEnglish
    Pages (from-to)32-35
    Number of pages4
    JournalThin Solid Films
    Volume442
    Issue number1-2
    DOIs
    Publication statusPublished - 2003 Oct 1

    Fingerprint

    Crystallization
    titanium oxides
    Magnetron sputtering
    Titanium dioxide
    magnetron sputtering
    crystallization
    pulses
    Temperature
    temperature
    Substrates
    Fused silica
    titanium dioxide
    silica glass
    anatase
    rutile
    photochemical reactions
    Ions
    X ray diffraction
    diffraction

    Keywords

    • Crystallization
    • Photocatalyst
    • Sputtering
    • Titanium oxide

    ASJC Scopus subject areas

    • Surfaces, Coatings and Films
    • Condensed Matter Physics
    • Surfaces and Interfaces

    Cite this

    Pulse mode effects on crystallization temperature of titanium dioxide films in pulse magnetron sputtering. / Miyagi, Takahira; Kamei, Masayuki; Ogawa, Tomoyuki; Mitsuhashi, Takefumi; Yamazaki, Atsushi; Sato, Tetsuya.

    In: Thin Solid Films, Vol. 442, No. 1-2, 01.10.2003, p. 32-35.

    Research output: Contribution to journalArticle

    Miyagi, Takahira ; Kamei, Masayuki ; Ogawa, Tomoyuki ; Mitsuhashi, Takefumi ; Yamazaki, Atsushi ; Sato, Tetsuya. / Pulse mode effects on crystallization temperature of titanium dioxide films in pulse magnetron sputtering. In: Thin Solid Films. 2003 ; Vol. 442, No. 1-2. pp. 32-35.
    @article{854571ccf1d44eb39734388d63abddc9,
    title = "Pulse mode effects on crystallization temperature of titanium dioxide films in pulse magnetron sputtering",
    abstract = "Pulse mode effects on the crystallization temperature and photocatalytic properties of TiO2 films were investigated. TiO2 films were deposited on silica glass substrates using a pulse magnetron sputtering apparatus in the unipolar and the bipolar pulse modes. X-Ray diffraction showed that in the bipolar pulse mode the rutile phase TiO2 film grew at lower substrate temperature compared with the unipolar pulse mode. The photocatalytic activities obtained from the photoreduction of Ag ions at the surface of TiO2 films indicated that the anatase phase TiO 2 films grown in the bipolar pulse mode had higher photocatalytic activity compared with those grown in the unipolar pulse mode. This suggests that the bipolar pulse mode is an effective technique to achieve higher photocatalytic activity of TiO2 film.",
    keywords = "Crystallization, Photocatalyst, Sputtering, Titanium oxide",
    author = "Takahira Miyagi and Masayuki Kamei and Tomoyuki Ogawa and Takefumi Mitsuhashi and Atsushi Yamazaki and Tetsuya Sato",
    year = "2003",
    month = "10",
    day = "1",
    doi = "10.1016/S0040-6090(03)00934-9",
    language = "English",
    volume = "442",
    pages = "32--35",
    journal = "Thin Solid Films",
    issn = "0040-6090",
    publisher = "Elsevier",
    number = "1-2",

    }

    TY - JOUR

    T1 - Pulse mode effects on crystallization temperature of titanium dioxide films in pulse magnetron sputtering

    AU - Miyagi, Takahira

    AU - Kamei, Masayuki

    AU - Ogawa, Tomoyuki

    AU - Mitsuhashi, Takefumi

    AU - Yamazaki, Atsushi

    AU - Sato, Tetsuya

    PY - 2003/10/1

    Y1 - 2003/10/1

    N2 - Pulse mode effects on the crystallization temperature and photocatalytic properties of TiO2 films were investigated. TiO2 films were deposited on silica glass substrates using a pulse magnetron sputtering apparatus in the unipolar and the bipolar pulse modes. X-Ray diffraction showed that in the bipolar pulse mode the rutile phase TiO2 film grew at lower substrate temperature compared with the unipolar pulse mode. The photocatalytic activities obtained from the photoreduction of Ag ions at the surface of TiO2 films indicated that the anatase phase TiO 2 films grown in the bipolar pulse mode had higher photocatalytic activity compared with those grown in the unipolar pulse mode. This suggests that the bipolar pulse mode is an effective technique to achieve higher photocatalytic activity of TiO2 film.

    AB - Pulse mode effects on the crystallization temperature and photocatalytic properties of TiO2 films were investigated. TiO2 films were deposited on silica glass substrates using a pulse magnetron sputtering apparatus in the unipolar and the bipolar pulse modes. X-Ray diffraction showed that in the bipolar pulse mode the rutile phase TiO2 film grew at lower substrate temperature compared with the unipolar pulse mode. The photocatalytic activities obtained from the photoreduction of Ag ions at the surface of TiO2 films indicated that the anatase phase TiO 2 films grown in the bipolar pulse mode had higher photocatalytic activity compared with those grown in the unipolar pulse mode. This suggests that the bipolar pulse mode is an effective technique to achieve higher photocatalytic activity of TiO2 film.

    KW - Crystallization

    KW - Photocatalyst

    KW - Sputtering

    KW - Titanium oxide

    UR - http://www.scopus.com/inward/record.url?scp=0141427833&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=0141427833&partnerID=8YFLogxK

    U2 - 10.1016/S0040-6090(03)00934-9

    DO - 10.1016/S0040-6090(03)00934-9

    M3 - Article

    AN - SCOPUS:0141427833

    VL - 442

    SP - 32

    EP - 35

    JO - Thin Solid Films

    JF - Thin Solid Films

    SN - 0040-6090

    IS - 1-2

    ER -