PULSE RADIOLYSIS STUDIES ON THE MECHANISM OF THE HIGH SENSITIVITY OF CHLOROMETHYLATED POLYSTYRENE AS AN ELECTRON NEGATIVE RESIST.

Y. Tabata, S. Tagawa, Masakazu Washio

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationAmerican Chemical Society, Polymer Preprints, Division of Polymer Chemistry
PublisherACS, Div of Polymer Chemistry
Pages287-288
Number of pages2
Volume25
Edition1
Publication statusPublished - 1984 Apr
Externally publishedYes

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Radiolysis
Polystyrenes
Electrons

ASJC Scopus subject areas

  • Polymers and Plastics

Cite this

Tabata, Y., Tagawa, S., & Washio, M. (1984). PULSE RADIOLYSIS STUDIES ON THE MECHANISM OF THE HIGH SENSITIVITY OF CHLOROMETHYLATED POLYSTYRENE AS AN ELECTRON NEGATIVE RESIST. In American Chemical Society, Polymer Preprints, Division of Polymer Chemistry (1 ed., Vol. 25, pp. 287-288). ACS, Div of Polymer Chemistry.

PULSE RADIOLYSIS STUDIES ON THE MECHANISM OF THE HIGH SENSITIVITY OF CHLOROMETHYLATED POLYSTYRENE AS AN ELECTRON NEGATIVE RESIST. / Tabata, Y.; Tagawa, S.; Washio, Masakazu.

American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. Vol. 25 1. ed. ACS, Div of Polymer Chemistry, 1984. p. 287-288.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Tabata, Y, Tagawa, S & Washio, M 1984, PULSE RADIOLYSIS STUDIES ON THE MECHANISM OF THE HIGH SENSITIVITY OF CHLOROMETHYLATED POLYSTYRENE AS AN ELECTRON NEGATIVE RESIST. in American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. 1 edn, vol. 25, ACS, Div of Polymer Chemistry, pp. 287-288.
Tabata Y, Tagawa S, Washio M. PULSE RADIOLYSIS STUDIES ON THE MECHANISM OF THE HIGH SENSITIVITY OF CHLOROMETHYLATED POLYSTYRENE AS AN ELECTRON NEGATIVE RESIST. In American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. 1 ed. Vol. 25. ACS, Div of Polymer Chemistry. 1984. p. 287-288
Tabata, Y. ; Tagawa, S. ; Washio, Masakazu. / PULSE RADIOLYSIS STUDIES ON THE MECHANISM OF THE HIGH SENSITIVITY OF CHLOROMETHYLATED POLYSTYRENE AS AN ELECTRON NEGATIVE RESIST. American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. Vol. 25 1. ed. ACS, Div of Polymer Chemistry, 1984. pp. 287-288
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