PULSE RADIOLYSIS STUDIES ON THE MECHANISM OF THE HIGH SENSITIVITY OF CHLOROMETHYLATED POLYSTYRENE AS AN ELECTRON NEGATIVE RESIST.

Y. Tabata, S. Tagawa, M. Washio

Research output: Chapter in Book/Report/Conference proceedingConference contribution

18 Citations (Scopus)

Abstract

Recently, chloromethylated polystyrene (CMS), a highly sensitive, high resolution electron resist with excellent dry etching durability, was developed. Very recently reactive intermediates in irradiated polystyrene, which is a starting material of CMS, have been studied and the transient absorption spectra of excimer, triplet states, charge-transfer complexes, and radical cations of polystyrene have been measured. The present paper describes the cross-linking mechanism of the high sensitivity CMS resist and compares it to that of polystyrene on the basis of data on reactive intermediates of polystyrene and CMS.

Original languageEnglish
Title of host publicationACS Symposium Series
EditorsL.F. Thompson, C.G. Willson, J.M.J. Frechet
PublisherACS
Pages151-163
Number of pages13
Edition266
ISBN (Print)0841208719
Publication statusPublished - 1984 Dec 1
Externally publishedYes

Publication series

NameACS Symposium Series
Number266
ISSN (Print)0097-6156

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)

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  • Cite this

    Tabata, Y., Tagawa, S., & Washio, M. (1984). PULSE RADIOLYSIS STUDIES ON THE MECHANISM OF THE HIGH SENSITIVITY OF CHLOROMETHYLATED POLYSTYRENE AS AN ELECTRON NEGATIVE RESIST. In L. F. Thompson, C. G. Willson, & J. M. J. Frechet (Eds.), ACS Symposium Series (266 ed., pp. 151-163). (ACS Symposium Series; No. 266). ACS.