PULSE RADIOLYSIS STUDIES ON THE MECHANISM OF THE HIGH SENSITIVITY OF CHLOROMETHYLATED POLYSTYRENE AS AN ELECTRON NEGATIVE RESIST.

Y. Tabata, S. Tagawa, Masakazu Washio

Research output: Chapter in Book/Report/Conference proceedingConference contribution

18 Citations (Scopus)

Abstract

Recently, chloromethylated polystyrene (CMS), a highly sensitive, high resolution electron resist with excellent dry etching durability, was developed. Very recently reactive intermediates in irradiated polystyrene, which is a starting material of CMS, have been studied and the transient absorption spectra of excimer, triplet states, charge-transfer complexes, and radical cations of polystyrene have been measured. The present paper describes the cross-linking mechanism of the high sensitivity CMS resist and compares it to that of polystyrene on the basis of data on reactive intermediates of polystyrene and CMS.

Original languageEnglish
Title of host publicationACS Symposium Series
EditorsL.F. Thompson, C.G. Willson, J.M.J. Frechet
Place of PublicationWashington, DC, USA
PublisherACS
Pages151-163
Number of pages13
Edition266
ISBN (Print)0841208719
Publication statusPublished - 1984
Externally publishedYes

Fingerprint

Radiolysis
Polystyrenes
Electrons
Dry etching
Cations
Charge transfer
Absorption spectra
Durability

ASJC Scopus subject areas

  • Chemistry(all)

Cite this

Tabata, Y., Tagawa, S., & Washio, M. (1984). PULSE RADIOLYSIS STUDIES ON THE MECHANISM OF THE HIGH SENSITIVITY OF CHLOROMETHYLATED POLYSTYRENE AS AN ELECTRON NEGATIVE RESIST. In L. F. Thompson, C. G. Willson, & J. M. J. Frechet (Eds.), ACS Symposium Series (266 ed., pp. 151-163). Washington, DC, USA: ACS.

PULSE RADIOLYSIS STUDIES ON THE MECHANISM OF THE HIGH SENSITIVITY OF CHLOROMETHYLATED POLYSTYRENE AS AN ELECTRON NEGATIVE RESIST. / Tabata, Y.; Tagawa, S.; Washio, Masakazu.

ACS Symposium Series. ed. / L.F. Thompson; C.G. Willson; J.M.J. Frechet. 266. ed. Washington, DC, USA : ACS, 1984. p. 151-163.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Tabata, Y, Tagawa, S & Washio, M 1984, PULSE RADIOLYSIS STUDIES ON THE MECHANISM OF THE HIGH SENSITIVITY OF CHLOROMETHYLATED POLYSTYRENE AS AN ELECTRON NEGATIVE RESIST. in LF Thompson, CG Willson & JMJ Frechet (eds), ACS Symposium Series. 266 edn, ACS, Washington, DC, USA, pp. 151-163.
Tabata Y, Tagawa S, Washio M. PULSE RADIOLYSIS STUDIES ON THE MECHANISM OF THE HIGH SENSITIVITY OF CHLOROMETHYLATED POLYSTYRENE AS AN ELECTRON NEGATIVE RESIST. In Thompson LF, Willson CG, Frechet JMJ, editors, ACS Symposium Series. 266 ed. Washington, DC, USA: ACS. 1984. p. 151-163
Tabata, Y. ; Tagawa, S. ; Washio, Masakazu. / PULSE RADIOLYSIS STUDIES ON THE MECHANISM OF THE HIGH SENSITIVITY OF CHLOROMETHYLATED POLYSTYRENE AS AN ELECTRON NEGATIVE RESIST. ACS Symposium Series. editor / L.F. Thompson ; C.G. Willson ; J.M.J. Frechet. 266. ed. Washington, DC, USA : ACS, 1984. pp. 151-163
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