Pulse radiolysis study on a highly sensitive chlorinated resist ZEP520A

Yuji Hosaka, Tomoko Gowa Oyama, Akihiro Oshima, Satoshi Enomoto, Masakazu Washio, Seiichi Tagawa

    Research output: Contribution to journalArticle

    7 Citations (Scopus)

    Abstract

    ZEP520A is one of the most popular positive electron beam (EB) resists used in research and photomask fabrication owing to its good spatial resolution, high sensitivity, and high dry etching resistance. Herein, EB-induced early reactions of ZEP520A were investigated via pulse radiolysis. Dissociative electron attachment and formation of a charge transfer complex were definitive contributing factors to the efficient degradation of ZEP520A. Furthermore, products induced by direct ionization of ZEP520A were observed in a highly concentrated ZEP520A solution in tetrahydrofuran, suggesting that early reactions in the ZEP520A solid film that were induced only by direct ionization could be simulated during pulse radiolysis in specific solutions.

    Original languageEnglish
    Pages (from-to)745-750
    Number of pages6
    JournalJournal of Photopolymer Science and Technology
    Volume26
    Issue number6
    DOIs
    Publication statusPublished - 2013

    Fingerprint

    Radiolysis
    Ionization
    Electron beams
    Photomasks
    Dry etching
    Positrons
    Charge transfer
    Fabrication
    Degradation
    Electrons
    tetrahydrofuran

    Keywords

    • Direct ionization
    • Electron beam resist
    • Pulse radiolysis
    • ZEP520A

    ASJC Scopus subject areas

    • Materials Chemistry
    • Polymers and Plastics
    • Organic Chemistry

    Cite this

    Pulse radiolysis study on a highly sensitive chlorinated resist ZEP520A. / Hosaka, Yuji; Oyama, Tomoko Gowa; Oshima, Akihiro; Enomoto, Satoshi; Washio, Masakazu; Tagawa, Seiichi.

    In: Journal of Photopolymer Science and Technology, Vol. 26, No. 6, 2013, p. 745-750.

    Research output: Contribution to journalArticle

    Hosaka, Yuji ; Oyama, Tomoko Gowa ; Oshima, Akihiro ; Enomoto, Satoshi ; Washio, Masakazu ; Tagawa, Seiichi. / Pulse radiolysis study on a highly sensitive chlorinated resist ZEP520A. In: Journal of Photopolymer Science and Technology. 2013 ; Vol. 26, No. 6. pp. 745-750.
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    AU - Washio, Masakazu

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